Used AMAT / APPLIED MATERIALS Producer SE #9275287 for sale

AMAT / APPLIED MATERIALS Producer SE is a state of the art chemical vapor deposition (CVD) reactor designed for use in the semiconductor fabrication industry. AMAT Producer SE is a single wafer production reactor that utilizes an inductively coupled plasma (ICP) source and multiple thermal sources to deposit a variety of materials--including oxides, nitrides, and metals--onto substrates. Its unique design combines single-wafer processing with high-temperature CVD for superior uniformity and superior productivity. APPLIED MATERIALS Producer SE is comprised of several main components, including an ICP source, a gas delivery system, a turret to hold several substrates, and thermal sources. The ICP source is an inductively-coupled high-frequency coil that is used to ionize gases in the reaction chamber, causing them to react and deposit materials on the substrates. The gas delivery system supplies the gases needed to carry out the deposition reaction, and the turret holds the substrates that will receive the deposited material. Finally, the thermal sources provide the energy needed to initiate and accelerate the deposition reaction. Producer SE is designed to be highly versatile, as it can be used for a variety of deposition applications, including thermal stable thin film deposition, nanoparticle deposition, and optical thin film deposition. It is available in three models—SE 75, SE 100, and SE 150 —to accommodate different wafer sizes and process requirements. AMAT / APPLIED MATERIALS Producer SE is energy efficient and environmentally friendly, as it reduces the need for additional process gases and energy, while also improving process stability and yield. Additionally, AMAT Producer SE is designed to maximize operator safety, as it features many safety features including controlled gas flow, an influx of process chamber protective gas, a sealed substrate storage area, and an emergency stop feature. Overall, APPLIED MATERIALS Producer SE is a powerful and versatile CVD reactor designed for use in the semiconductor fabrication industry. Its innovative design enables single wafer processing with improved uniformity and productivity, making it an ideal choice for high-yield production of advanced materials.