Used AMAT / APPLIED MATERIALS Producer SE #9311351 for sale

AMAT / APPLIED MATERIALS Producer SE is an advanced technology wafer fabrication reactor that offers superior performance and flexibility for a wide range of applications. This versatile wafer etch reactor has a large processing area with advanced chamber design for optimal plasma uniformity and repeatability. AMAT Producer SE incorporates the latest automation and process control technology which allows for precise process control and monitoring. APPLIED MATERIALS Producer SE is a dual wafer platform system designed for efficient throughput. It is equipped with two large, vertically mounted, cooling heads which are adjustable in pitch from -15 to +15 degrees. The increasing flush gas flow rate also allows for rapid cooling and release of the wafers from the chuck. Producer SE is designed to provide a uniform, repeatable plasma in the processing area, eliminating hotspots and accelerating etch rates. The heart of AMAT / APPLIED MATERIALS Producer SE is its advanced technology robust power supply. This power supply enables tight control and improved performance of the reactive ion etch plasma. AMAT Producer SE has a high frequency RF generator that runs on an orbital frequency of 13.56 MHz and has an adjustable RF-frequency output from 0 to 400 kHz. This ensures a clean, stable background plasma with an adjustable power ratio for optimized etch rates. APPLIED MATERIALS Producer SE is designed to provide outstanding flexibility and wafer-to-wafer repeatability for etch processing. Its ergonomic design incorporates a patented RF matching circuit for consistent RF performance over a wide range of loads, and a dual bolted magnet manifold which helps to create an isotropic plasma shape. In addition, its closed-cycle cooling system with inert gas provides excellent repeatability and allows for repeatable etch rates across different process runs. In summary, Producer SE is a robust, versatile and cost-effective wafer fabrication reactor. Its large processing area, adjustable pitch cooling heads, robust power supply and RF generator, and advanced magnetic manifold and RF matching circuit ensure excellent performance and superior repeatability and control for a wide range of applications.