Used AMAT / APPLIED MATERIALS Producer SE #9354650 for sale

AMAT / APPLIED MATERIALS Producer SE
ID: 9354650
Wafer Size: 12"
SACVD System, 12".
AMAT / APPLIED MATERIALS Producer SE is a type of semiconductor reactor designed specifically for jobs requiring high throughput, high production yield, and low process variability. It is a Single Wafer Centrifugal Deposition (SWCD) reactor specifically designed to provide high deposition selectivity, uniform layer composition, and exceptional process repeatability. AMAT Producer SE integrates a high-production by-directional sputtering equipment and an end-point detector system to provide high deposition selectivity and uniform layer composition. The by-directional sputtering unit produces uniform thin film by producing both a negative and a positive electrical charge on the target surface. This ensures more even layer deposition compared to conventional sputtering systems. The end-point detection machine allows for additional process control as well as automated shut-off at defined end-points. The centrifugal deposition (CD) technology utilized in APPLIED MATERIALS Producer SE deposition reactor is a high throughput, high production, low process variability technology that reduces thin-film deposition time compared to conventional sputtering. This is achieved by spinning the wafer at high angular velocity while depositing the thin-film, thus maximizing the deposition uniformity. Producer SE reactor features an advanced tool architecture for enhanced process automation, thereby reducing process cycle time. In addition, AMAT / APPLIED MATERIALS Producer SE reactor has variable frequency drives that provide precise control for all key operating parameters, including temperature, pressure, RF power, and flow rate. The reactor also features robust material delivery systems that allow for precise and stable flow rates, yielding high deposition rates while minimizing potential variability. In summary, AMAT Producer SE is a centrifugal deposition reactor featuring advanced technology designed for high deposition selectivity and process repeatability. This technology, in combination with its robust delivery systems, ensures the highest production yield, yield uniformity, and reduced process cycle times.
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