Used AMAT / APPLIED MATERIALS Producer SE #9390419 for sale

AMAT / APPLIED MATERIALS Producer SE (Substrate Etch) reactor is a state-of-the-art photolithography chamber designed for advanced etch processing of silicon wafers. It is capable of both dry and wet etching of substrates, and can be used for a wide range of etch applications such as: deep reactive ion etch (DRIE), inductively coupled plasma etch (ICP) and ion beam etch (IBE). The advanced technology found in AMAT Producer SE makes it one of the most powerful etch systems available today. APPLIED MATERIALS Producer SE utilizes a dual wall overhead heater design that relies on independently controlled ports and independent RF source to ensure consistent and accurate temperature control. This unique feature allows the reactor to reach and maintain optimal temperatures by preventing outgassing or other thermal phenomena that can cause temperature irregularities. The independent overhead heater also ensures excellent uniformity of etch throughout the entire wafer. Another advantage of Producer SE is its ability to process multiple wafers simultaneously. The system has six processing chambers, allowing it to perform multiple etches in parallel for faster and more cost-effective production. As a result, AMAT / APPLIED MATERIALS Producer SE is ideal for large scale production or high-volume applications. AMAT Producer SE features a fully automated process chamber that is capable of handling complex, precise etch operations. It is equipped with a multi-tool, multi-recipe controller for precise and simultaneous control of multiple etch operations. It also has advanced automation algorithms and closed loop process control to ensure uniform etch processes. The robust design of APPLIED MATERIALS Producer SE allows it to deliver precise control of temperature, pressure, and process gases, resulting in optimal etch characteristics. The system is also designed for maximum productivity and throughput, with minimal tool time and maintenance requirements. Producer SE delivers a stable and reliable process chamber, offering customers maximum performance and reliability for etch production. It is the perfect choice for driving high-yield, cost-effective etch processes.