Used AMAT / APPLIED MATERIALS Producer SE #9409076 for sale

AMAT / APPLIED MATERIALS Producer SE is an advanced reactor designed for use in semiconductor fabrication. AMAT Producer SE incorporates an inductively coupled plasma (ICP) source, providing superior etch performance. This enables higher process productivity, improved process performance and uniformity, and reduced defectivity. APPLIED MATERIALS Producer SE features an integrated physical vapor deposition (PVD) module and multi-frequency ICP source, providing superior control of etching depth, shape, and control of process conditions. The choice of inductively coupled plasma and physical vapor deposition enables uniform etching across larger areas of multiple substrates with very good controllability. The advanced ICP source provides a high level of power control with superior process uniformity and repeatability. The integrated multi-frequency ICP source offers enhanced selectivity and response times in etching processes, allowing for faster reaction speeds of up to 60 ms. The advanced plasma source enables a wide range of process recipes, providing superior performance and superior process versatility. In addition, Producer SE is also equipped with a high aspect ratio etch module for greater process accuracy and repeatability. The floating chamber design of AMAT / APPLIED MATERIALS Producer SE also improves etching uniformity, delivering superior performance with uniform films and seed layers. The advanced chamber design also facilitates larger workloads, allowing for fast throughput and high process capacity. Finally, AMAT Producer SE provides cutting-edge fabrication capabilities while sustaining low operating costs. The advanced plasma source technology minimizes downtime and downtime costs, while features like automatic calibration and contactless electrode tuning enable faster operation and reduced maintenance costs. As a result, APPLIED MATERIALS Producer SE offers superior etching capability while maintaining low both operation and maintenance costs.