Used AMAT / APPLIED MATERIALS Producer XT #9208802 for sale

AMAT / APPLIED MATERIALS Producer XT reactor is an advanced plasma-enhanced chemical vapor deposition (PECVD) chamber designed to offer improved yields, cost savings, and end-product reliability. The PECVD process produces thin, highly uniform layers of dielectric and conformal film layers in a range of semiconductor and optoelectronic materials. AMAT Producer XT chamber offers increased process capability with its larger working area, higher source powers and improved temperature stability. APPLIED MATERIALS Producer XT chamber consists of a process showerhead, a powered lift-arm door, a hydrocarbon-free plasma source and the base vacuum chamber. An RF heater powers the process showerhead, enabling the vapor deposition process with higher source powers for improved PECVD film quality and uniformity. The hydrocarbon-free plasma source allows for higher deposition rate capabilities with improved thickness uniformity over a wider range of film thicknesses. The base vacuum chamber has a maximum pressure of just 1Torr (133Pa), allowing for excellent thin film deposition with reduced temperatures. In terms of features, Producer XT reactor offers excellent wafer uniformity across all exposed surfaces, a fast settling rate of 1,400um/min and a fully automated wafer transfer and loading equipment. The user interfaces are designed to be intuitive and the system has a wide range of customizable parameter settings to meet the demands of different process requirements. It has also been designed with the goal of maximizing the unit's yield and throughput, offering increased productivity and lower cost per wafer. To ensure the quality and safety of the process, AMAT / APPLIED MATERIALS Producer XT reactor has a range of safety features including a self-aligning cooling machine, emergency shut down features and automated process monitoring. The tool also has a comprehensive suite of diagnostic tools for efficient troubleshooting. In conclusion, AMAT Producer XT reactor is an advanced PECVD asset designed to deliver improved efficiency, safety and quality in the deposition of thin-film layers. Its wide range of features and customizable parameters make it an ideal choice for producing semiconductor and optoelectronic materials.