Used AMAT / APPLIED MATERIALS Producer #135489 for sale
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ID: 135489
Wafer Size: 8"
Vintage: 1999
CVD system, 8"
Process: HT NIT
Wafer shape: JMF
Wafer size: 8"
Producer type: long mainframe
SMIF: manual
System placement: through the wall
Chambers:
Chamber A: HT NIT
Chamber B: HT NIT
Chamber A:
Heater: ceramic
Clean method: remote plasma
Frequency: dual HF and LF
Manometer: dual 10 / 100 Torr
Chamber B:
Heater: ceramic
Clean method: remote plasma
Frequency: dual HF and LF
Manometer: dual 10 / 100 Torr
Beat exchanger: Steelhead 0
HF generators:
Chamber A: V-(RFG2000-2V)
Chamber B: V-(RFG2000-2V)
LF generators:
Chamber A: V-(DPG-10)
Chamber B: V-(DPG-10)
Mainframe:
Type: Producer long
SMIF: manual
Electrical requirements:
Line frequency: 50 / 60 Hz
Line voltage: 200 / 208V
Line amperage: 400A
System monitor: 1st and 2nd monitors
System placement: through-the-wall
Gas delivery:
MFC type: STEC 4400MC
Valves: FUJIKIN 5 Ra Max
Filters: MOTT
Transducer: MKS without display
Regulators: VERIFLO
Chamber A gases:
N2O, 500 sccm
N20, 5 slm
NH3, 300 sccm
N2, 10 slm
SiH4, 500 sccm
SiH4, 1 slm
Ar, 5 slm
NF3, 3 slm
Chamber B gases:
N2O, 500 sccm
N20, 5 slm
NH3, 300 sccm
N2, 10 slm
SiH4, 500 sccm
SiH4, 1 slm
Ar, 5 slm
NF3, 3 slm
Can be inspected
1999 vintage.
AMAT AMAT / APPLIED MATERIALS Producer is a chemical vapor deposition (CVD) reactor designed for deposition of thin film coatings to improve substrate performance and durability. This CVD reactor is equipped with an innovative bellows-style vertical electrode, which allows for precise and consistent deposition of thin film coatings onto a wide variety of substrates, ranging from semiconductor materials to metals. The vertical electrode configuration also offers improved uniformity of deposition, resulting in greater coating thickness control and higher yields. AMAT Producer is outfitted with a 2-meter Twin Chamber, which facilitates dual-sided wafer production and can process up to four wafers of varying thickness simultaneously. This CVD reaction chamber also utilizes a rapid thermal recessing equipment, which is a new PVD process that produces atomic layer deposition (ALD) or MIPT-ALD coatings in a fraction of the time of other conventional thin-film production methods. APPLIED MATERIALS APPLIED MATERIALS Producer offers versatility and flexibility, allowing users to process various substrates with a wide range of film thickness. It also allows multiple re-coatings of single wafers and wafer stacking for optimum throughput. Its efficient wafer positioning system paired with multi-gas mixing ability further enhances deposition uniformity and reproducibility. In addition, the CVD reaction chamber ensures repeatable process results without retooling, by utilizing uniform temperature distribution, pressure control, and superior up-time reliability. AMAT / APPLIED MATERIALS Producer features an intuitive graphical user interface (GUI) which allows users to monitor deposition process and unit status in real time. This CVD reactor also has an intuitive remote control machine which allows users to monitor and control the operation of the tool from a remote location. Furthermore, diagnostic tools are included to ensure process and asset compatibility, while built-in safety features protect the operation integrity of the model in the event of unexpected conditions. In summary, AMAT AMAT / APPLIED MATERIALS Producer CVD reactor is an advanced, high-powered chemical deposition equipment designed to deliver improved substrate performance and durability. This CVD reactor is outfitted with robust technology and intuitive controls, making it a reliable and efficient solution for substrate deposition. With its versatile and flexible design, superior up-time reliability, and sophisticated GUI, AMAT Producer offers users the flexibility to thrive in a dynamic marketplace.
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