Used AMAT / APPLIED MATERIALS Producer #166757 for sale

AMAT APPLIED MATERIALS reactors (Advanced Materials Atomic Layer Reactor System) are an advanced form of chemical vapor deposition (CVD) reactors. These systems are capable of creating thin films of materials at a molecular level. The thin films produced by AMAT / APPLIED MATERIALS reactors can be used for creating semiconductor devices, such as transistors, diodes and capacitors. The reactors consist of two main components: the sidewall source and the plasma source. The sidewall source is composed of two stainless steel tubular elements which contain a gas mixture. This mixture is heated and ions are then accelerated through the tubular elements into the plasma source. The plasma source consists of a CuNiTi chamber with a series of electrodes. These electrodes are either perforated or with a series of throated holes which generate a plasma field when the gas mixture is ionized. AMAT reactors reach extremely high temperatures of up to 1200°C, which is important for maintaining uniform heat distribution in the chamber. This uniform heat distribution helps to ensure uniform thin film deposition on the wafers. The high temperatures in these reactors also allow for substrates to be exposed to high concentrations of reactant gases and plasma. This combination allows for more efficient, faster and uniform coatings of thin films to the substrates, providing consistent and reliable semiconductor device performance. For depositing thin films, the deposition gas precursors and the reactant gases are both introduced into the chamber in a controlled manner. The two gas mixture are then activated by the electrodes, which cause a reaction and help to create a thin film on the wafer. The thin film is then taken out of the chamber after being cooled by a coolant, providing a ready and homogeneous film. APPLIED MATERIALS reactors are becoming increasingly important for the production of semiconductors for modern electronics and computing. As semiconductor technology continues to progress and device sizes get smaller, thin film deposition capabilities like AMAT / APPLIED MATERIALS reactors will be essential for keeping up with demand.