Used AMAT / APPLIED MATERIALS Producer #293824606 for sale

AMAT / APPLIED MATERIALS Producer is an industrial-grade vacuum deposition reactor that is specifically designed for thin film deposition and process integration. This reactor is interfaced with a variety of thin film deposition technologies and capabilities such as physical vapor deposition, sputter deposition, chemical vapor deposition, and atomic layer deposition. It has several features, such as multiple source baskets, an in-situ pyrometer, and a multi-point end-of-run (EOR) plasma monitor. It is also able to deliver up to 2,400 watts power. AMAT Producer consists of several subsystems, including a vacuum chamber, vacuum pumps, and process and power sources. The vacuum chamber is fitted with a viewport and contains a modular, telescoping susceptor for up to 8-in wafers and small samples. The vacuum pumps are designed to provide precise pressure control and are used to evacuate the chamber and maintain a predetermined pressure. APPLIED MATERIALS Producer's array of process sources includes both DC and RF magnetrons, respectively used for sputter deposition and reactive ion etch (RIE) processes. The DC magnetron is a self-contained source that is mounted internally, while the RF magnetron is mounted externally and interfaces to the main power supply. The power source, which provides up to 2,400 watts of RF power, is modular and equipped with provisions for tuning and matching of the RF source. The internal pyrometer provides in-situ temperature monitoring of the wafers during deposition, while the EOR plasma monitor allows the operator to assess the end-point of the deposition process. This enables the operator to fine-tune the deposition parameters and optimize the process. Producer is also integrated with a range of components enabling cooling of the chamber walls, as well as an active environmental control system for monitoring and controlling substrate temperature and chamber cleanliness. AMAT / APPLIED MATERIALS Producer is an efficient, versatile and user-friendly reactor that provides excellent thin film deposition solutions for a range of microelectronics applications. It is easy to operate and provides the flexibility to switch from one process to another, allowing for excellent process repeatability and reproducibility. Overall, this reactor is an excellent choice for those needing a reliable and robust thin film deposition system.