Used AMAT / APPLIED MATERIALS Producer #9213897 for sale
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ID: 9213897
Wafer Size: 8"
Vintage: 1999
System, 8"
Process application: Silicon oxide and silicon nitride
SMIF: (4) ASYST INX 2200
Mainframe: FR BROOKS
NESLAB Steelhead1 Chiller
Mainframe pump: IPX 100
Process chamber A:
Type: Silicon oxide and silicon nitride
AE RG 2000 Generator
Chuck: Ceramic heater
Clean unit: RPS
Gas configuration:
N2 10000 SCCM
NF3 3000 SCCM
NH3 100 SCCM
NH3 1000 SCCM
SIH4 500 SCCM
N2O 500 SCCM
N2O 5000 SCCM
AR 5000 SCCM
Process chamber B:
Type: Silicon oxide and silicon nitride
AE RG 2000 Generator
Chuck: Ceramic heater
Clean unit: RPS
Gas configuration:
N2 10000 SCCM
NF3 3000 SCCM
NH3 100 SCCM
NH3 1000 SCCM
SIH4 500 SCCM
N2O 500 SCCM
N2O 5000 SCCM
AR 5000 SCCM
1999 vintage.
AMAT / APPLIED MATERIALS Producer (also known as MXTD) is a type of reactor used in the manufacture of advanced material products. It is a multi-process batch chamber equipment featuring multiple reaction chambers and precision process control. The system is capable of producing monolithic and composite materials such as those used in microelectronic devices and advanced optical components. The chamber unit consists of several different sized process chambers that can be configured to meet the needs of the user. Each chamber is equipped with unique pre-installed equipment and components such as rotary pumps, valves, and power supplies. When the chamber is in use, the reaction chambers are filled with a chosen solution and the process is started. A vacuum is created inside the reaction chambers when the process begins and pressure is maintained in order to ensure high quality material production. Once the process is initiated, the user can control the reaction by adjusting the temperature, pressure and flow rates. The reaction then proceeds until the desired product is obtained. AMAT Producer ensures uniform composition, high purity, and excellent homogeneity. The MXTD is also equipped with a wide range of additional features that make it suitable for a variety of applications. The integrated piezo scanning machine, which is integrated in the reactor, allows for the precise measurement of process variables such as temperature and pressure, even at low levels. It also provides a stable environment for consistent repeating of the same processing technique, making MXTD highly repeatable. The MXTD reactor also features an advanced data logging tool that can be used for analysis of the process data, as well as for process control. This asset allows users to view data on their own in real-time, or store and analyze the reaction process using third-party analysis software. Overall, the MXTD is an advanced, multi-process and universal reaction chamber model capable of producing high-quality monolithic and composite products. The integrated process control systems ensure uniformity and repeatability of products, while the technologically advanced data logging equipment allows users to analyze the process data and gain further insight into their applications.
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