Used AMAT / APPLIED MATERIALS Producer #9221488 for sale

AMAT Produce is a reactor designed for various fabrication processes. This reactor is used for thin-film deposition, providing exceptional control and uniformity of film properties over a wide range of film thickness and deposition rates. The equipment is designed for either batch or inline processing, allowing for a wide range of process and material combinations. The system provides a repeatable, controllable and reliable process and uniformity results. AMAT / APPLIED MATERIALS Producer includes two Long Island deposition sources and two main chambers, each with two load locks. The load locks can be bolted together to form a single chamber assembly. The two load locks on each side are separately vented to control process pressures and temperatures. The chamber components and load locks are constructed of high quality stainless steel and aluminum plus an optional titanium lined chamber base. The chamber dimensions, interior temperature and pressure are maintained and monitored by an integrated, computer-controlled temperature and pressure regulator. AMAT Producer is designed for high throughput applications, providing production rate capability up to 30 thin film structures in 15 minutes. The deposition source provides up to 1 kW of substrate power for uniform thin film deposition. This source can be operated in manual or automatic modes. The Manual Mode allows process operators to precisely control variables including temperature, pressure, and flow rate of the reactor's process gases. The Automatic Mode enables remote control of these variables. The control unit for APPLIED MATERIALS Producer is built upon proven machine architecture. The tool includes an intuitive graphical user interface (GUI), allowing the user to input process parameters, monitor process performance, and access historical data across multiple processes. The asset also includes a powerful process development module to quickly set up and optimize thin-film deposition processes. Producer features a variety of physical and chemical sensors measuring the parameters of reactive process gases and thin-film deposition performance. These monitored parameters include deposition rate and uniformity, substrate temperature, and thermoelectric deposition rate. The model ensures that the thin-film deposition process follows the desired parameters. AMAT / APPLIED MATERIALS Producer is ideal for use in a variety of thin-film deposition applications. It is well-suited for applications requiring uniform thin film deposition on substrates with high aspect ratios of up to 20:1. The equipment offers high throughput capabilities and enables process developers to quickly set up and optimize thin-film deposition processes. With its advanced control system and quality components, it is the ideal platform for reliable and repeatable thin-film deposition processing.