Used AMAT / APPLIED MATERIALS Producer #9262473 for sale

AMAT / APPLIED MATERIALS Producer is an advanced deposition and etching reactor designed for the manufacture of semiconductor devices. It incorporates the latest technological advances to allow for deposition and etching of nanometer-scale layers with high precision and uniformity. The equipment utilizes a plasma chamber with two electron sources to generate high-energy ions with a wide variety of parameters such as current intensity and plasma species. This allows for the deposition of materials with excellent uniformity on substrates with defined sizes and thicknesses. The chamber is equipped with an optical emission spectrometry that monitors the chemical composition of the plasma and allows for the precise control of the desired energy levels and doping profiles. A mass spectrometry component is also included to monitor the sputtering rates of the incoming plasma ions onto the substrate. The system is capable of a variety of etching processes as well, such as reactive ion etching, deep reactive ion etching, and plasma enhanced chemical vapor deposition. The unit also has comprehensive control capabilities through a comprehensive graphical user interface and process control machine. The process control tool provides users with a number of simulation-based processes for aiding in the creation of industry standard process recipes. The chamber is highly modular and can be configured to accommodate different process recipes, allowing users to run specific processes that are optimized for the specific application. The design of the asset allows it to accommodate a variety of deposition and etching processes. The deposition chamber consists of a double powered substrate holder with variable power levels and a non-volatile memory model. Reactive gases and specialty gases can be added to the chamber as needed to perform specific processes. The etching chamber is designed to minimize damage to the substrate and run high selectivity etch processes. AMAT Producer is a powerful semiconductor production equipment that ensures high-precision deposition and etching. It is designed for extreme accuracy, high throughput, and advanced process control. The system is suitable for the manufacture of semiconductor devices from ultra-small features to large substrates with high precision and uniformity.