Used AMAT / APPLIED MATERIALS PVD Chamber for Endura II #293664709 for sale

AMAT PVD Chamber is specifically designed for use in the Endura II Reactor equipment. This chamber allows for easy access to the entire interior for maximum efficiency while accommodating a wide variety of substrate sizes. It is built with an ion shower which improves the homogeneity of illumination and resulting film uniformity on the wafer surface. The design allows for both vertical and horizontal deposition, making the chamber highly versatile for different applications. A robust quench management system controls cooling and provides uniform film thickness in deposition processes. The unit provides stability and repeatability in the four PVD (Physical Vapor Deposition) plating processes. It has integrated safety systems and the Pure Reactive Gas De-ionizer (PRGD) ensures no gas impurities during deposition. The reaction chamber is also equipped with a two-dimensional linear scanning motion machine that moves the substrate for enhanced area uniformity. The chamber has large support poles and pedestals that ensure accuracy of substrate positioning. The chamber is capable of precisely controlling the dosage and flux of material on the substrate, ensuring a consistent and predictable deposition rate. The three-dimensional automated motion tool facilitates uniformity between batch runs. The asset also provides flexibility with the addition of several custom motion and cooling options. The Reaction chamber can be used for a broad range of applications. These include integrated circuit fabrications, Interconnects of components, and surface treatments such as clean, planarization and oxidation. It is suitable for coating wide range of materials such as, copper, aluminum, titanium, cobalt, chrome, palladium, and annealing tungsten, with sophisticated techniques such as, Electro-deposition, Reactive Sputter Deposition, Anodic etching and Ion Bombardment Deposition. In conclusion, APPLIED MATERIALS PVD Chamber for the Endura II Reactor model is a robust and reliable equipment designed to provide precision and rapid processes for a range of applications. It is ideal for research and development use, and meets industrial requirements for stability, repeatability, reliability, and highly efficient deposition processes.