Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #293669533 for sale

AMAT Endura PVD Chamber is a specialty Physical Vapor Deposition (PVD) reactor designed for advanced semiconductor materials processing. This state-of-the-art equipment provides the reliability and dependability needed to process a wide range of wafer sizes and materials, optimizing chip performance and yield and enabling a variety of deposition processes. The Endura PVD Chamber utilizes Advanced Materials' proprietary Magnetron Sputtering and Ionized Physical Vapor Deposition (iPVD) technologies, providing superior uniformity and reliability. The PVD chamber consists of a vacuum system, target face, process zones, a robot transfer area, and process control unit. It has a high-precision robotic arm with advanced environmental control for the automated transfer and processing of up to six-inch diameter wafers. This high performance and stability allow for a high degree of control over material properties, enabling tight uniformity over large run-to-run and wafer-to-wafer production of density, thickness, resistivity, etch bias, and step coverage. The Endura PVD Chamber is also designed to be energy efficient and to reduce the need for preventive maintenance. The machine also eliminates the need for costly cryogenic cooling systems, which can stabilize even the highest temperature processes. The chamber includes a proprietary high power packed source which helps reduce the need for frequent source changes, thus providing more reliable and cost-effective equipment maintenance. Finally, the Endura PVD Chamber has advanced process control systems and diagnostics which help to monitor and identify potential problems early on, allowing for quick response and reduced downtime. In addition, all tool parameters such as process pressure, power, and deposition rate can be monitored and correspondingly adjusted from the chamber's onboard computer. Combined with the chamber's comprehensive diagnostic capabilities, these features create an optimized, highly reliable vacuum deposition chamber.