Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #9202555 for sale

AMAT / APPLIED MATERIALS PVD Chamber for Endura is a physical vapor deposition (PVD) reactor specifically designed for use with the Endura platform. The chamber is used to deposit thin semiconductor films onto semiconductor wafers and other substrates. AMAT PVD Chamber for Endura has a bell-jar-type structure with a top loading design and a pressure loadlock chamber. The design features a large bottom dome and two smaller top domes, which are used for loading and unloading substrates. This design allows for easy access to the substrates and wafers during the deposition process. The chambers are constructed from high-grade stainless steel to ensure performance and reliability. The Endura equipment also utilizes a modular magnetic field emission system that enables the injection of a gas into the unit's plasma. This allows for a wide variety of gases including inert, reactive, and noble gases to be used during deposition. If the desired gas is not available, the machine has the ability for the user to program custom gas configurations. The tool also has an optional charge exchange asset, which is designed to minimize charge contamination and maximize deposition uniformity. The chamber also contains a number of integrated safety features such as sensors to detect a sudden change in pressure and a lockout feature to prevent operation with the wrong gas. The safety features are designed to ensure safe and reliable operation of the chamber. In addition to the chamber, the Endura platform contains other components such as power supplies, controllers, and feedthrough connections. The combination of these components and APPLIED MATERIALS PVD Chamber for Endura enables the user to create high quality wafers and substrates. The ability to fine-tune parameters and manipulate the process provides the user with the flexibility necessary to produce custom materials for various applications. The chamber has been used in a variety of industries including semiconductor, LED, RFID, and MEMS technologies. In conclusion, PVD Chamber for Endura provides the user with the ability to precisely deposit thin films on substrates with ease and reliability. The chamber has revolutionized the deposition process and enabled users to create materials for a variety of applications. The simple and modular design of the chamber allows for adjustment and customization of the process, making it a reliable and versatile PVD reactor.