Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #9275270 for sale

AMAT / APPLIED MATERIALS PVD Chamber for Endura is an advanced plasma-enhanced physical vapor deposition (PVD) reactor designed for semiconductor device fabrication. This chamber utilizes a linear dosing of process gases to produce a repeatable deposition rate and uniform deposit profile. The PVD chamber is designed for high-throughput, high-quality PVD deposition of thin films on substrates in semiconductor fabrication processes. The PVD chamber features a powerful magnetron source, metal-ceramic construction, and automated process control equipment. The metal-ceramic construction ensures a robust and durable design, while the automated process control system provides precise and repeatable parameters for deposition. The magnetron source produces a high level of energy that produces a high-quality deposition. The linear dosing process of the PVD chamber facilitates a consistent, repeatable, and uniform deposition. The chamber is designed to provide a variety of deposition processes, including thermal barrier coating, metal pattering, and nitride film deposition. The PVD chamber is equipped with a wafer load lock, pumping station, and a load/unload port. The wafer load lock provides an efficient staging area to prevent undesired process gas loss and particle contamination. The pumping station allows for the rapid evacuation of the chamber, allowing for a short processing cycle time. The load/unload port provides an easy interface to the deposition process, with features such as a user-friendly graphical user interface and access to a remote computer via USB cable. The chamber is designed with advanced controls and monitors, including a temperature control module, temperature readouts, and capacitance sensors. The temperature control module ensures accurate and repeatable operation, while the temperature readouts provide visual monitoring of the process. The capacitance sensors provide continuous feedback on the deposition process, including the deposition rate, profile, and uniformity. The PVD chamber also features an integrated safety unit that monitors the chamber pressure and vacuum levels and provides an alarm in the case of an abnormal event. The safety machine also includes a control module for powering off the chamber if necessary. AMAT PVD Chamber for Endura is an advanced PVD chamber designed for high-volume, high-quality semiconductor fabrication processes. This chamber utilizes a linear dosing of process gases, metal-ceramic construction, and automated process control tool for precise and repeatable parameters for deposition. The chamber is equipped with a wafer load lock, pumping station, and load/unload port for efficient and easy transferring of wafers. Advanced controls, monitors, and safety systems ensure the precision and reliability of the deposition results.