Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #9275283 for sale

AMAT AMAT / APPLIED MATERIALS PVD Chamber for Endura is a chemical vapor deposition reactor used in the deposition of thin films and other materials in the semiconductor industry. The chamber, which is designed to work in a Vacuum Deposition Systems environment, consists of a process chamber, a retainer ring, an active electrode, a high-frequency induction power supply, a vacuum equipment, and other necessary components. The process chamber has an outer wall of stainless steel with a highly polished inner wall to ensure the highest film quality possible. It is designed to be leak-tight and has an adjustable aperture to enable process control. It also features a retainer ring which helps keep the chamber firmly secured. The active electrode is responsible for providing the necessary inputs into the Plasma Enhanced Deposition process, controlled by the high-frequency induction power supply. The vacuum system helps provide the necessary level of vacuum required for the deposition process, typically in the order of 10-6 Torr range. In order to ensure the best possible process results, AMAT PVD Chamber for Endura is equipped with a number of innovative features. These include tiltable gas injectors, a customizable Effusivity monitoring unit, a floating-point control machine, closed-loop sputter gun control, an ion source, and a programmable bias power source. Moreover, the chamber is designed to be easily upgradable, allowing users to keep up with ever-evolving needs while ensuring long-term process stability. Overall, APPLIED MATERIALS PVD Chamber for Endura provides an advanced chamber that is highly efficient, reliable and versatile, enabling users to develop precise and reliable thin films over many production cycles. The advanced features available make the chamber an ideal choice for a wide range of users, from university laboratories to the semiconductor industry. With its cost-effectiveness and reliable performance, PVD Chamber for Endura is the perfect solution for many thin film requirements.