Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #9275294 for sale

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ID: 9275294
Wafer Size: 12"
12" Process: Extensa Su Magnet Cryo pump OB-IF8 Gate valve: VAT Heater: 0010-24456 Adaptor: 0040-89818 Manometer: 1350-00255 ATM gauge: W117V-3H-F12M-X30014 Capacitance pirani gauge: 3310-00073 Pedestal integration box: 0010-28071 Hot ion / Pirani gauge: 0190-26769 Shutter sensor assembly: 0190-10801 Source assembly: 0010-44917 Angle vacuum valve: AVT-150M-P-03 Heater lift motor Wafer lift motor: MQMA012AF Shutter motor: PK564AW2-A8 Drivers: Heater driver: 3096-1007 Wafer lift driver: 0190-15328 Pedestal driver: PV2A015SMT1PA0-C1 Magnet rotation driver: BXD400B-S MFC: AR 50 AR 20 N2 92 No 5-Phase driver No ISAC CP 10 Block board No defective power supply.
AMAT / APPLIED MATERIALS PVD Chamber for Endura is a physical vapor deposition (PVD) reactor designed for use in a variety of production applications in a variety of industries. PVD is a deposition process which involves the evaporation of a source material in order to produce a solid film on a substrate. The Endura Chamber provides a reliable and cost-effective means of deposition in a variety of industries. The Endura Chamber features an active pumping system which delivers high-purity, high-pressure process gas. The system also includes a high-power source for evaporating the material to be deposited. This source consists of filament-type tungsten boats, triode heated filaments, or electron guns. The chamber also includes several safety features, such as quartz window seals, leak detectors, and explosive gas detectors. The chamber is constructed out of stainless steel, UHV-compatible aluminum, and other corrosion-resistant materials. The chamber also includes two atmosphere viewports which allow for the observation and monitoring of the deposition process. The viewports are optically sealed to prevent the contamination of the interior. The Endura Chamber is designed to achieve high productivity, repeatability, and reproducibility. Its computer-based control system enables automated recipes and data collection, process monitoring, and other advanced features. It is designed to meet the requirements of high-volume production and capable of sustaining temperature up to 1100°C. In addition to providing dependability and flexibility in the deposition process, the Endura Chamber helps minimize process-related costs. This is achieved due to its easy maintenance and low operating costs. Additionally, its efficiency and advanced technologies help increase process productivity while maintaining the highest quality standards. Overall, AMAT PVD Chamber for Endura provides a reliable and cost-effective way of performing physical vapor deposition. Its advanced safety and control features, coupled with its dependability and flexibility, make it an ideal choice for many production applications.
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