Used AMAT / APPLIED MATERIALS PVD Chamber for Endura #9300940 for sale

AMAT / APPLIED MATERIALS PVD Chamber for Endura is a high-performance reactor used in the semiconductor and other industries. It is designed to facilitate Physical Vapor Deposition (PVD) processes, such as Sputter Deposition and Thin-film Optical Coating. The PVD Chamber consists of a gas source, a sputtering target, a crucible, a vacuum chamber, and a high-energy, high-frequency electric field. The gas source is used to create a positively charged gas atmosphere which will then bombard the target material and deposit a thin film. The crucible contains the target material which is vaporized and deposited onto the substrate. The vacuum chamber creates a low pressure environment which enables the deposition of a high quality, dense film. The high-energy, high-frequency electric field aids in improving the uniformity of the deposition process. The PVD Chamber is manufactured using high-grade components and materials. This helps to ensure outstanding temperature and pressure control, resulting in superior quality films deposited. The chamber also features an advanced plasma deposition system with an adjustable capping feature. This allows for the deposition of a uniform film that is free from impurities such as material bridging and wormhole defects. The chamber also features a large upper door opening which is useful for substrate exchange and substrate cleaning. Additionally, a centrally located robotic arm is used to provide efficient substrate loading and unloading capabilities. AMAT PVD Chamber for Endura is a robust and reliable piece of equipment. It has been designed to provide superior process control and production efficiencies when used for physical vapor deposition processes. Furthermore, it is capable of depositing high quality, repeatable films with low particle contamination levels. As such, it is the ideal tool for the reliability-driven semiconductor industry.