Used AMAT / APPLIED MATERIALS Siconi R2 #9375619 for sale

AMAT / APPLIED MATERIALS Siconi R2
ID: 9375619
CVD System.
AMAT / APPLIED MATERIALS Siconi R2 is a powerful and reliable etch reactor that has been designed for processing a variety of materials, including silicon, silicon dioxide, tantalum, copper, gallium arsenide and other materials. AMAT Siconi R2 is a dual-sided plasma-based etch reactor featuring two independent, high-power chambers. Each chamber is capable of conducting both reactive ion etching (RIE) and remote plasma etching (RPE). APPLIED MATERIALS Siconi R2 is equipped with a flexible power supply equipment with a wide range of DC, RF and microwave sources for controlling different processes. It also features a unique onboard power management system that allows easy tuning and optimization of process recipes. The unit utilizes multiple individual generator channels for optimum flexibility and versatility. Siconi R2 also features an advanced software and control machine for automating processes and scheduling. It has a built-in process window function and software to monitor the etching and deposition processes. The software also allows remote access and control, as well as advanced data analysis and process optimization functions. For the best possible results, AMAT / APPLIED MATERIALS Siconi R2 is designed with advanced deposition and etching techniques. The types of techniques that can be used include plasma-enhanced chemical vapor deposition (PECVD), sputter etching, ion-beam etching, reactive ion etching, deep-reactive ion etching, electron-capture ashing, and reflectometry. AMAT Siconi R2 also has an array of safety features, including automated shutdown and detection systems for protection. The chamber area is also enclosed for maximum safety. APPLIED MATERIALS Siconi R2 also has a patented gas distribution tool that ensures uniform gas flow and uniform etching across the entire substrate surface. Siconi R2 is a powerful and reliable etch reactor that is ideal for processing a variety of materials. With advanced power supplies, software and control systems, and advanced deposition and etching techniques, AMAT / APPLIED MATERIALS Siconi R2 is a great choice for etching and deposition processes. Its safety features and patented gas distribution asset make it a safe and efficient choice for processing any type of material.
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