Used AMAT / APPLIED MATERIALS Siconi R2 #9375622 for sale

AMAT / APPLIED MATERIALS Siconi R2 is a high-power, high-capacity reactor equipment used in semiconductor production. The system consists of two main components: the substrate support table and the reactor chamber. The substrate support table is made of stainless steel and supports the substrates during processing. The reactor chamber is an atmospheric-pressure qualified vacuum chamber made of stainless steel and is used to provide a clean and safe environment for the substrates during the process. AMAT Siconi R2 has a large feature set, providing precise and repeatable control of process parameters. The unit is equipped with an RF generator, a precise air-cooled chuck that provides uniform temperature distribution, and an advanced Real-Time gas control machine. The RF generator is capable of delivering up to 10 Watts of RF power, providing process repeatability throughout the cycle. The air-cooled chuck is designed to reduce thermal gradients across the entire wafer, allowing for uniform process parameters, such as oxide thickness and etch depth. The Real-Time control tool enables precise reaction control during the cycle, ensuring consistent quality and repeatability. APPLIED MATERIALS Siconi R2 provides an optimal environment for process control, allowing for the highest levels of process repeatability with minimal tool downtime. Its precise and repeatable control of process parameters result in improved fabrication yields. The asset is designed for automated production and acts as an important link in the semiconductor device manufacturing process. This state-of-the-art reactor model provides a safe, clean, and consistently repeatable atmosphere, while also enabling maximum throughput.