Used AMAT / APPLIED MATERIALS T002-00360 #293655401 for sale

AMAT AMAT / APPLIED MATERIALS T002-00360 is a computer-controlled plasma reactor used for chemical vapor deposition (CVD) processes. It is used to evaporate various materials such as silicon, silicon nitride, titanium and tungsten, resulting in a thin film coating. AMAT T002-00360 has a gas mixture equipment which can be tailored to the individual process requirements and includes options for direct heat or direct plasma generation. APPLIED MATERIALS T002-00360 reactor is designed to deliver a homogenous gas mixture throughout the chamber space, ensuring uniform deposition. This robust, reliable and easy-to-operate reactor can deliver consistent and repeatable thin film deposits across large wafer substrates. T002-00360 features a computer-controlled pressure and gas flow control system for optimal and repeatable process conditions. It utilizes a diffusion-type gas distribution method to ensure uniform flow of the vapor over the substrate. AMAT / APPLIED MATERIALS T002-00360 can also be equipped with a quartz tube, through which the Evaporation material is added into the plasma. The robust design of the unit ensures a stable and consistent process, and the flexibility of the process parameters allows for the deposition of a wide variety of materials. AMAT T002-00360 also features a laser interferometry-based End Point Detection (EPD) machine used to accurately detect the end of the deposition process and optimise the stoichiometry of the material deposited. The EPD tool is also used to monitor the profile of the films deposited, to ensure that the desired deposition uniformity is achieved. APPLIED MATERIALS T002-00360 is suitable for all low-temperature PECVD, ALD and CVD applications. It is important to note that T002-00360 requires routine maintenance and recalibration to ensure consistent and repeatable results across long runs. The use of high quality materials also will ensure that the deposition layer uniformity and performance is maintained throughout the life of the unit. Overall, AMAT / APPLIED MATERIALS T002-00360 is an advanced, reliable and reliable plasma deposition asset used for a variety of CVD processes. It provides uniform coverage over large wafer substrates and is equipped with innovative technologies to improve accuracy and efficiency. AMAT T002-00360 is also highly flexible, allowing for the customization of the process parameters depending on the application. With regular maintenance and recalibration, APPLIED MATERIALS T002-00360 is an excellent choice for advanced CVD processes.