Used AMAT / APPLIED MATERIALS TCG Rack for RTP #293662056 for sale

AMAT / APPLIED MATERIALS TCG Rack for RTP
ID: 293662056
AMAT / APPLIED MATERIALS TCG Rack for RTP (Thermal Chemical Vapor Deposition) is a state-of-the-art reactor designed for the control of deposition processes for various applications, from semiconductor materials such as silicon and germanium to various metal and dielectric layers. The Rack consists of three components: a gas distribution system, a power supply, and a temperature control unit. The gas distribution system delivers the precise mix of gases needed to create the desired material. The power supply ensures efficient utilization of the reactive gases and direct control of the deposition rate. The control unit provides the temperature cycling necessary to obtain material with the desired characteristics. The Rack is designed to be able to provide accurate control and flexibility for the deposition process, and to prevent contamination and deposition of undesired films on the substrate. It features a regulated amount of gas flow, and a constant exhaust flow to remove by-products from the reaction chamber. The gas flow can be divided into up to four separate outputs, to process different substrates with distinct requirements in the same batch. The Rack is equipped with a wide range of temperature control options, from 300°C to 880°C (572°F to 1616°F). The power supply consists of an AC- or DC-controlled resistive heater, and a proportional valve to set the gas flow rate at the desired level. The Rack can process a variety of substrates, including semiconductor wafers, glass slides, and OLED substrates. It is capable of achieving high accuracy deposition rates, and has compatibility with multiple gases, including oxygen, hydrogen, nitrogen, silane, dichlorosilane, and germane, among others. In short, AMAT TCG Rack for RTP is a leading-edge reactor offering the tightest process control and highest flexibility for both thin-film- and thick-film- deposition applications. It features precise temperature regulation, a wide range of gases, and excellent substrate coverage, providing all the necessary tools to obtain excellent deposition results.
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