Used AMAT / APPLIED MATERIALS Twin chamber for Producer SE #293665500 for sale

AMAT / APPLIED MATERIALS Twin chamber for Producer SE
ID: 293665500
Wafer Size: 12"
Vintage: 2007
12" 2007 vintage.
AMAT / APPLIED MATERIALS Twin chamber for Producer SE is a processor and/or etcher designed for semiconductor manufacturing processes, such as selective etching. This reactor's engine is composed of two chambers, the etch chamber and the process chamber. Both chambers are designed to withstand high temperatures and vacuum levels. The etch chamber consists of an electron impact etch (EIE) source, with a tetrode or magnetron discharge mode. The EIE source generates electrons for generation of higher-energy ions, which increases etch rate and process selectivity. The process chamber has an inductively coupled plasma (ICP) source to create higher aspect ratio etching of difficult-to-etch materials. The ICP generates high pressure plasmas for reactive strategies, resulting in lower damage to materials. The pump equipment of AMAT Twin chamber for Producer SE is designed for extremely low-leakage operation. High-vacuum pumping produces a wide range of process operating pressures enables high-resolution etch processing. An automated optimizer is also available, which allows for precise pressure control within the chambers. The Automated Sampling system provides quick and reliable sample evaluation and process monitoring. The unit can simultaneously analyze the etch rate and selectivity of different gases, using on-wafer gas sampling. The optical machine of the automated sampling tool uses a digital video camera, yielding accurate evaluation of the sample. APPLIED MATERIALS Twin chamber for Producer SE also houses the State-of-the-Art Control computer, which is a high-performance personal computer with a graphical user interface. This allows for optimal data logging and control functions to be applied for rapid process feedback. The asset also facilitates easy recipes and works with a Windows-based operating model. AMAT is designed for maximum throughput and yield, with flexibility to use a variety of chemicals. This chamber is also highly reliable and requires minimal maintenance. The chamber is equipped with a variety of accessories, such as gas cabinets, recipe containers, an exhaust purifier, and shut-off valves. All of these features make Twin chamber for Producer SE an ideal choice for semiconductor manufacturing processes.
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