Used AMAT / APPLIED MATERIALS Twin chamber for Producer SE #293665727 for sale

AMAT / APPLIED MATERIALS Twin chamber for Producer SE is a high-performance semiconductor etching reactor designed to provide precise control of etching process conditions, with significantly enhanced uniformity and lower defect rates than traditional single-chamber etching tools. The equipment is comprised of two independent vacuum chambers, each with its own electron cyclotron resonance (ECR) plasma source. This allows precise simultaneous etch processing of two separate substrates in each vacuum chamber. The two independent ECR plasma sources in each chamber feature easy access and easy maintenance. Each plasma source is capable of precise control of plasma power, frequency, RF bias, and gas distribution for improved process yields. Additionally, advanced multi-point closed loop sample automation system enables the tool to automatically adjust process conditions during etch runs and provide on-the-fly optimization of etching processes. The chambers are housed in a robotic tool transport frame which contains the wafer transfer unit, plumbing, and RF (radio frequency) shielded shielding. This allows for quick and easy transfer of two substrates between the two chambers with minimal contamination. The frame also allows for more efficient maintenance since it eliminates the need to manually access the chambers. The heart of the machine is its software control interface which provides for an intuitive graphical user interface for easy tool setup and process control, along with powerful features such as automated process optimization and monitoring, fault diagnostics, user security, alarms, data logging, and FDA GxP compliance with 21 CFR part 11. This allows for easy and accurate operation of the asset with highly repeatable etch results. AMAT Twin chamber for Producer SE is a powerful etching tool that enables engineers and scientists to obtain high quality precision etch results while reducing process time and cost. With its advanced features, strong reputation for reliability, and exceptional performance, it provides an excellent cost-effective solution for etching applications.