Used AMAT / APPLIED MATERIALS Twin chamber for Producer SE #293665728 for sale

AMAT / APPLIED MATERIALS Twin chamber for Producer SE is a specialized reaction chamber designed to provide high-performance processing of wafer substrates. The equipment is offered in several configurations to meet the needs of different production processes. The Twin Chamber features two high-vacuum reaction chambers: a lower chamber for depositing silicon oxide, polysilicon, nitride, or other compounds, and an upper chamber for etching and other operations. The lower chamber is equipped with a variety of sources and is temperature-controlled for processing uniformity. It has a heated baseplate to maintain wafer temperature during processing, as well as two separate platen systems for uniform film deposition. The chamber also features a high-pressure gas delivery system and an automated gas management unit. The upper chamber is designed to handle operations such as deep silicon etching and various LPCVD processes. It is equipped with a full selection of ceramic-lined linear RF sources, as well as a variety of ceramic and quartz anode plates for deep etching. The chamber also includes a high-pressure machine for delivering different gases for etching processes. Both chambers have been designed to work together to deliver high-performance processing. The lower chamber supplies a uniform deposition of material, while the upper chamber etches and deposits various other materials as needed. The tool is also equipped with high-temperature heating elements which allow for improved wafer uniformity in the high temperature processes, such as titanium deposition. The asset also includes an automated wafer handling model to transfer wafers between the two chambers. This equipment is designed to provide fast and efficient wafer processing. The system is also designed to integrate with Process Control software and a host computer, allowing for real-time monitoring and control of process parameters. AMAT Twin chamber for Producer SE has been designed to provide high-performance wafer processing for a range of applications. The combination of two separate chambers and an automated wafer handling unit has enabled the machine to deliver quality results with reduced cycle times. This makes it an ideal solution for those looking to improve their production process.