Used AMAT / APPLIED MATERIALS Ultima HDP-CVD #9139463 for sale

AMAT / APPLIED MATERIALS Ultima HDP-CVD is an advanced chemical vapor deposition reactor designed to provide Advanced Materials customers with high-quality, thin-film layer deposition. A key feature of this reactor is its High-Density Plasma (HDP) capability. The configuration of the HDP source allows for a consistent and uniform plasma excitation over the entire substrate, providing uniform and defect-free thin-film layers with outstanding reproducibility. Other features that make AMAT Ultima HDP-CVD an attractive choice for film deposition include its automated process optimization routine, which can offer precise control over the process parameters, and its high capacitance active-plasma power supply, which ensures stable and robust plasma excitation over a wide range of process gases. To deposit thin-film layers, APPLIED MATERIALS Ultima HDP-CVD utilizes a hot-wall source and employs high frequency plasma excitation. This generates a homogenous plasma that promotes sustained chemical activity necessary for the deposition of quality thin-film layers. Unlike cold-wall sources, the hot-wall type used in Ultima HDP-CVD does not require an externally heated enclosure to achieve desired temperatures. This simplifies operation and saves energy. The reactor is capable of producing thin-film materials in a variety of configurations, including single to multiple layers. It is also built on an industrial-grade robotic process platform, allowing for precision engineering of the deposition environment. This design allows users to automate the deposition process, reducing the need for manual labor and increasing the throughput of the system. The system is designed to be fully integrated within a factory environment, enabling an efficient production process with minimal downtime for maintenance. In addition, the software provides advanced safety features to ensure safe operations throughout the process. AMAT / APPLIED MATERIALS Ultima HDP-CVD is also compatible with most supply sources and can be used in conjunction with a range of substrates. This makes it suitable for a variety of applications, such as producing integrated logic and memory devices, nanostructures, and thin-film optical components. In summary, AMAT Ultima HDP-CVD is an advanced chemical deposition reactor that offers excellent deposition quality and repeatability. It features a hot-wall plasma source that provides a uniform plasma and operates at a range of temperatures, enabling a wide range of processes. Its automated process optimization features and integrated design also enable improved efficiency and decreased maintenance costs. APPLIED MATERIALS Ultima HDP-CVD is an attractive choice for many applications, including integrated logic and memory device, nanostructure, and thin-film optical component fabrication.