Used AMAT / APPLIED MATERIALS Ultima X #9257392 for sale

AMAT / APPLIED MATERIALS Ultima X is a commercial deposition reactor designed for efficient spatial, temporal, and material uniformity in thin film deposition. It provides an economical, yet efficient, solution for producing high-quality thin film films for semiconductor, MEMS, optical, data storage, and touch panel applications. Its modular design allows for multi-target operation with both fixed and manual turret tooling. AMAT Ultima X is specifically designed for low-pressure, chemical vapor deposition (LPCVD), and molecular beam epitaxy (MBE) processes. Its multipurpose design allows for use in both semi-industrial and industrial environment and cost-effectively fabricates thin films with excellent uniformity. It employs a linear rotating UHV chamber for precision deposition of thin-film materials with high purity. Meanwhile, the advanced pulse-pause deposition reduces the total process times. APPLIED MATERIALS Ultima X is known for its exceptional uniformity and highly precise thickness control over the entire wafer surface, minimizing edge-to-edge variation. It includes a range of deposition tools and is designed to work with a broad range of reactants and materials. Its comprehensive temperature, pressure and flow control systems provide an even disturbance to ensure highly uniform results. Moreover, Ultima X is designed for superior wafer handling capabilities preventing mechanical damages and reassuring a high-level of safety during operation. Its modular design facilitates easy installation, and the reactor's window and viewport angles are adjustable to user preferences. Furthermore, the reactor can be easily integrated and interfaced with latest automation and metrology solutions. Overall, AMAT / APPLIED MATERIALS Ultima X is an energy-efficient, cost-effective deposition solution, specifically designed for the production of high-quality thin film solutions for wide-ranging applications. Its robust and modular design and range of process capabilities make it an invaluable tool that streamlines the deposition process.