Used AMAT / APPLIED MATERIALS Ultima #9116892 for sale

AMAT / APPLIED MATERIALS Ultima Reactor is a high-precision, high-efficiency process tool designed for the manufacture of advanced, low-temperature, thin-film transistor (TFT) based flat panel display applications. It is the flagship model of AMAT Ultima series of process tools. APPLIED MATERIALS Ultima Reactor is designed for thin film deposition and etching processes. It features a standard single-chamber system that allows multiple gases to be simultaneously supplied to the substrate. Ultima reactor's design includes a patented RF plasma generation system, electrostatic chuck for precise substrate clamping, automated feedback system, and integrated temperature controller. The substrate is held on the chuck surface and reacted directly with the plasma within the reactor chamber. AMAT / APPLIED MATERIALS Ultima Reactor is capable of depositing or etching films as thin as 5 nanometers and it can achieve uniformity of 5 nm or better. It is also capable of depositing and etching aluminosilicate and metal oxide films at room temperatures (20-200⁰C). The reactor can also handle a variety of gaseous and liquid chemistries at various pressures as well as the deposition of materials at high-density plasma. Additionally, the reactor has a modular design, allowing it to be customized to a specific process. AMAT Ultima Reactor is easy to use and efficient in production. It provides a reliable and repeatable method for deposition and etching of various thin films, including polycrystalline silicon, fluorinated amorphous silicon, metal oxides, and aluminosilicate films. The reactor is also compatible with various substrate materials, like glass, polyimide, and quartz. Finally, APPLIED MATERIALS Ultima Reactor provides a long lifetime of reliable process performance.