Used AMAT / APPLIED MATERIALS Ultima #9190317 for sale

AMAT / APPLIED MATERIALS Ultima reactor is an advanced plasma etching system for semiconductor devices. The system is designed for high-performance, low-cost processing, and to enable precision etching of a wide range of materials and high-aspect-ratio structures. AMAT Ultima reactor is composed of a load lock chamber, an electron cyclotron resonance (ECR) source, and an inductively coupled plasma (ICP) source. The load lock chamber enables the introduction of wafers and pre-cleaning of the wafer before etching. The ECR source generates a powerful high-frequency electromagnetic field, which creates highly energetic electrons. These electrons interact with the plasma to create a highly uniform and ionized plasma. The ICP source then supplies additional energy to the plasma, as well as adds chamfer gas and a reactant gas. APPLIED MATERIALS Ultima reactor provides process repeatability through advanced process control algorithms and is optimized to reduce gas-phase and particle-phase deposition. It also generates extremely short edges, which are ideal for high-aspect-ratio structures. In addition, it has a wide range of process capabilities including dry etching, physical vapor deposition (PVD), low-temperature polysilicon (LTPS), and liquid crystal display (LCD) processes. Ultima reactor is optimized for performance with customizable recipes. It is incredibly fast, with high throughput rates, and it has a high etch rate and excellent deposition selectivity. Its process flexibility makes it suitable for a variety of process configurations, including single-wafer, cluster tools, and multi-etchers with simultaneous processes. It also has an easy-to-use recipe editing tools, enabling users to modify process parameters to fit a particular application. AMAT / APPLIED MATERIALS Ultima reactor is a highly advanced plasma etching and deposition system, with precise etching and deposition capabilities, highly repeatable process control, and it is suited for a wide range of semiconductor processes. Its high efficiency, flexibility, and advanced technology make AMAT Ultima reactor an ideal choice for the fabrication of highly complex microelectronics.