Used AMAT / APPLIED MATERIALS Ultima #9298247 for sale

AMAT / APPLIED MATERIALS Ultima reactor is a next-generation tool for dielectric etching of silicon-based substrates used in the semiconductor manufacturing process. AMAT Ultima is a powerful, high-throughput plasma-etching reactor that can process large wafers and effectively etch materials without the need for additional chemicals. APPLIED MATERIALS Ultima reactor's advanced technology provides increased etch uniformity, improved throughput, and excellent process control for etching in sub-micron and ultra-large-scale integration (ULSI) processes. Ultima reactor is based on a triple-freestanding pedestal platform, which supports three different work stations, each with its own process chamber. An onboard computer system is used to control the process parameters and monitor environmental conditions such as temperature, pressure, and atmospheric parameters. Its advanced features include a robust vacuum system, a variety of plasma sources, and gas-handling capabilities. AMAT / APPLIED MATERIALS Ultima's plasma sources are capable of generating plasma at temperatures of up to 4500 °C, and its ultra-low-power technology has the capability to maintain high etch rates with minimal ion bombardment and high selectivity. This ensures higher yields with high-quality results. AMAT Ultima reactor is also capable of masking and plastic deposition with its on-board ECR and inductively-coupled plasma sources, as well as controlled- oxidization of the sub-layers beneath the oxide layer. The onboard computer system integrates a variety of sophisticated features, such as real-time process monitoring, automated recipe loading and parameter tuning, and advanced fault diagnosis and diagnosis software. It also provides data logging and analysis, giving users access to instant results and saving valuable time. APPLIED MATERIALS Ultima can handle a variety of materials with excellent selectivity and uniformity, making it an ideal choice for the dielectric etching of silicon-based substrates. Furthermore, Ultima reactor is cost-effective and energy-efficient, with a low power consumption of 12.52 kW, making it suitable for 24/7 production. It also ensures environmentally safe operation with its in-situ plasma source clean capability, which eliminates the need for hazardous chemicals. Overall, AMAT / APPLIED MATERIALS Ultima reactor is an advanced, highly-capable tool for the dielectric etching of silicon-based substrates used in the semiconductor industry. It offers excellent uniformity, high throughput, and process control for sub-micron and ultra-LARGE SCALE INTEGRATION technology, making it an ideal choice for industrial applications.