Used AMAT / APPLIED MATERIALS Ultima #9351211 for sale

AMAT / APPLIED MATERIALS Ultima reactor is a state-of-the-art vacuum deposition equipment designed for use on semiconductor and other semiconductor-related substrates. The system is designed to provide superior throughput, uniformity, and reliability when compared to conventional technologies. It is suitable for use in a variety of applications, such as photolithography, etching, and film growth. The reactor is a precision single-cavity unit with a unique wafer source design, featuring a horizontal geometry that is highly repeatable and uniform across an entire batch of substrates. The machine also has a three-beam optical monitoring tool that allows for microwave energy measurement, potentially allowing last-mile power fault detection. AMAT Ultima reactor is capable of performing physical vapor deposition (PVD) using standard sputter sources. Alternate vacuum processes such as reactive sputtering, evaporation, ion plating and chemical vapor deposition (CVD) can also be performed, allowing for greater versatility. The asset features advanced process monitoring capabilities, as well as a complete suite of data analysis and reporting functions. Various in-situ spectroscopic diagnostics are available, including optical emission spectroscopy, Auger electron spectroscopy, X-ray photoelectron spectroscopy, and electron energy loss spectroscopy. These allow for an unprecedented level of process control during deposition. The reactor also offers advanced process automation functions that enable a more efficient multi-run operation. It includes an automated process optimization feature for quick process setup and optimization, and a built-in metrology tool for in-situ wafer characterization. Its high-speed motion and wafer handling systems allow for fast, repeatable processes. Ultimately, APPLIED MATERIALS Ultima reactor provides users with a reliable, repeatable process environment that is designed to help chip fabrication facilities reduce production costs and maximize yields. Its integrated process capability, advanced process diagnostics and automation allow users to achieve outstanding throughput, uniformity and reliability. It also offers a wide range of features tailored to the needs of modern semiconductor applications.