Used APPLIED MATERIALS Centura 5200 DXZ #64984 for sale

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ID: 64984
Darc Silane CVD System, 8" 208A, 3 Phase, 50/60Hz 87KVA, 10,000amps Chamber A,B,C: DxZ Silane Chamber, E: Single Cool Down, F: Orienter Process gas used: SiH4, H2, CF4, HE Wide Body Loadlock, HP Robot SNNF, HP Robot" 2000 vintage See attached for more specifications.
APPLIED MATERIALS Centura 5200 DXZ is a semiconductor processing reactor designed for the fabrication of semiconductor devices. The reactor features a large-area wafer transfer chamber and process chamber with two small-area load locks. It offers high-accuracy, high-precision process control for the production of transistors, diodes, transistors, and more. Centura 5200 DXZ offers an integrated ion source with a high-speed linear magnetron, providing a high-uniformity ion source field, adjustable current densities, and accurate target-to-wafer distance. The reactor has a large-area vacuum equipment and integral hot-wall evacuation system with dual roughing pumps and multiple inlet/outlet ports. APPLIED MATERIALS Centura 5200 DXZ reactor unit includes three independent chambers that can be used as stand-alone tools or in series. The transfer chamber provides high-speed processing and a large-area substrate loading and unloading capacity. The process chamber includes a high-speed rotating magnetron source for increased uniformity and fine-grain control of the substrate. The third chamber is the etch chamber, which utilizes a high-power waveguide magnetron to provide an uniform and high-rate anisotropic etch. Centura 5200 DXZ reactor machine offers several advanced features. It has an automatic substrate cleaning and preparation technology, allowing for increased yields and faster cycle times. It also includes an integrated in-situ diagnostic tool, which monitors and adjusts the wafer temperature and chemical reactions in real time. The reactor offers fine-grained tuning of multiple parameters such as profile, dosage, speed, and temperature. APPLIED MATERIALS Centura 5200 DXZ reactor asset is designed for a wide spectrum of processes, from lithography to multi-layer deposition, etching, and deposition processes. It is suitable for use on compound semiconductors, such as gallium arsenide, with increased yields and cycle times. It is also capable of handling high-energy implantation, such as lithography, metrology, and photoresist stripping, without compromising performance. With its precise control, high density, and high-precision operation, Centura 5200 DXZ is a valuable tool in the semiconductor industry.
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