Used APPLIED MATERIALS Centura 5200 #111644 for sale

APPLIED MATERIALS Centura 5200 is a multi-chamber horizontal semiconductor reactor designed for high-volume production of advanced microelectronic devices. It is capable of processing substrates up to 8-inch wafers with a variety of advanced film applications including shallow trench isolation (STI) etch, passivation, gate oxide deposition, and chemical vapor deposition (CVD). This is a fully automated equipment with a large loadport that can accommodate multiple wafers and is capable of accommodating various cassette sizes and configurable process modules. The process chamber of Centura 5200 is a stainless-steel cylinder that allows the system to perform a wide range of deposition, etching, and cleaning processes at both atmospheric and low-pressure operations. The vacuum unit in APPLIED MATERIALS Centura 5200 is capable of achieving high-quality vacuum and can reach base pressures of 1E-8 torr. It consists of a mechanical pump and a bakeable, backed diffusion pump with a turbo-molecular pump. This machine has been designed to be compatible with a variety of corrosive and reactive gases. Centura 5200 utilizes a Programmable Logic Controller (PLC) to control the reactor and to provide an interface for the operator. This tool features a computer-controlled monitoring and control asset that allows for precise real-time process control. APPLIED MATERIALS Centura 5200 also features an isolated clean room environment to minimize particle and contamination. This enables the highest manufacturing tolerances and advanced process control for yield optimization. Centura 5200 is equipped with multiple sensors and closed-loop control systems that can adjust wafer temperature, process pressure and flow rate, and output power to ensure maximum wafer quality. The model also includes a cooling equipment to ensure the temperature is properly maintained in the chamber, in addition to monitoring and controlling the ultraviolet and ozone levels around the chamber. In conclusion, APPLIED MATERIALS Centura 5200 is a versatile, high-performance semi-conductor reactor system capable of advanced film applications and high-speed, high-yield production. It utilizes an isolated cleanroom environment, multiple sensors and control systems, and a PLC control unit to ensure maximum wafer quality. With its wide range of capabilities and advanced process control, Centura 5200 is an ideal solution for manufacturers looking for a reliable, efficient, and cost-effective lithography solution.