Used APPLIED MATERIALS Centura 5200 #174265 for sale

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ID: 174265
Wafer Size: 8"
Vintage: 1997
WxP system, 8" Includes: Centura Main Frame System Controller/AC Power Box Process: Etch Back (W.EB) System Power Rating: 208 VAC 3-Phase Loading Configuration: Wide Body Load Lock Chamber Robot Type: HP Robot wafer handling assembly CRT Monitor and Monitor Base with light Pen x2 RF Generator Rack x1 (ENI OEM-12B3-03) (4) Nabtesco Dry Pump (EV4002) (2) Toyota Dry Pump (EC100L) (2) Dikin Chiller (UBRP2AMPE ) SMC Chiller (INR-498-012D-X012) Showa Denko Scrubber Chamber Configuration: Load Lock Chamber A Load Lock Chamber B Transfer Chamber Chm Position A: Centura WxP Chamber Chm Position B: Centura WxP Chamber Chm Position C: Centura WxP Chamber Chm Position D: Centura WxP Chamber Chm Position E: Empty Chm Position F: Orienter Chamber De-installed and crated 1997 vintage.
APPLIED MATERIALS Centura 5200 is an advanced transistor-level plasma etch equipment that comes with a wide range of benefits to users. This device is a specialized tool for the fabrication, packaging, and testing of ultra-modern semiconductor chips and components. It's reliable, efficient, and a cost-effective etching solution. Centura 5200 features a powerful single wafer inductively-coupled plasma source. This source is capable of producing extremely large volumes of ionized hydronium ions at high temperatures, enabling high etch rates at times as low as 5 nanoseconds. The process uses high frequency power and a reactive material, usually a gas, to oxidize the surface of the silicon to create tiny trenches and tunnels. APPLIED MATERIALS Centura 5200 follows the industry-standard Multi-View Design (MVD) provides users with unmatched precision and accuracy. It also employs parallel-sensor technology that provides a better view of the substrate, allowing users to quickly detect any weaknesses that may limit process yields. Centura 5200 is a fully automated etching system. The design and construction of the unit have been tailored to minimize the risk of product contamination. Features like an advanced silicone web cleaning machine and automated end-effector loading and unloading ensures that users need only minimal manual intervention to ensure a high-quality, contamination-free product. APPLIED MATERIALS Centura 5200 is designed for superior reliability. Its high-precision PFI (Portable Film Implant) tool ensures evaporated material is consistently distributed and uniform, helping to increase process control and yield optimization. Additionally, with its integrated ion gate, users can quickly and easily improve process flexibility. Centura 5200 is a fully-featured etching asset that brings unparalleled benefits to users. This device is easily integrated into existing production lines and offers an efficient and cost-effective etch solution. Its reliable and accurate design, advanced automation, and superior process control make it one of the best etching solutions on the market today.
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