Used APPLIED MATERIALS Centura HDP CVD #100063 for sale

APPLIED MATERIALS Centura HDP CVD is an advanced chemical vapor deposition (CVD) equipment designed for advanced microelectronic and nanotechnology processing applications. The system has been designed to provide improved performance, increased flexibility and improved uniformity compared to older CVD systems. The unit is equipped with a quartz tube and two heated susceptors, a lower and an upper, along with a gas delivery machine. The quartz tube is a single-ended pressure chamber and includes the quartz tube, its top and bottom flanges and seals, a lumen feedthrough, and level adjusters. The susceptors are heated by infrared lamps which results in rapid heating and cooling of the substrate to be deposited; it also produces a uniform thermal field across the substrate surface. The gas delivery tool on Centura HDP CVD consists of a gas flow meter, a sequence valve, a blanket gas supply and bypass valves. The gas flow meter enables precise measurement of the gas supply flow rates from the individual gas cylinders. The sequence valve aids in controlling the flow of gas from the gas sources to the asset. The blanket gas supply allows for the delivery of a cumulative inert gas blanket over the substrate. The bypass valves are used for emptying the chamber of the model in case of a malfunction. The equipment is further equipped with a vacuum pump and safety valves, pressure gauges and thermocouple sensors to monitor and measure the vacuum and temperature levels, respectively, inside the chamber. APPLIED MATERIALS Centura HDP CVD system also has a powerful controller software which allows users to program the various process parameters to produce different film qualities and uniformity levels. The software can also be used to store, analyze and recreate the process recipes and settings. The unit provides high throughput with fast deposition rates and uniformity, while simultaneously controlling the quality of the deposited film. It can be used to deposit metal and other metal-based films such as aluminum, copper and titanium, as well as a variety of dielectric films and oxides. The machine is also capable of working with various processes like ALD (Atomic Layer Deposition) and conformal deposition. Centura HDP CVD tool provides a reliable and optimized CVD experience that is highly accessible for fabrication industries. It is capable of producing a high-quality deposition with improved uniformity and purity that is critical for the success of the latest semiconductor and nanotechnology products.