Used APPLIED MATERIALS Centura MxP #130910 for sale
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ID: 130910
PECVD SiO2 / SiON / SiO2 system
3 chambers: (2) Poly, (1) Oxide
Power: 208VAC, 3ø, 50/60Hz
ENI-OEM-12BX3
Eabara A30W X2
Ebara AA70W
Ebara A70W X2
Gases : Ch A-He, N2,SiH4, CF4, N2O
Ch B-He, N2,SiH4, CF4, NF3, NH3, N2O
Ch C-He, N2,SiH4, CF4, N2O
Process Kits
Clamp chucks
EPD
Turbos
Dry pumps (Edwards IL/IH600)
(Qty 3) RF Gen ENI OEM-12B
HE
Neslab chiller
Rear monitor
All cables
Software: English
De-installed Q1 2010
2000 vintage.
APPLIED MATERIALS Centura MxP reactor is a high-performance, large-scale equipment designed to enable cost-effective production of mass-market products and wafer structures. The system is equipped with a variety of technologies to ensure maximum efficiency and compatibility with the most demanding fabrication processes. The reactor integrates multiple elements, including a large-area chamber, a thermally homogeneous deposition unit and an automated plasma source, for precise and efficient processing of sensitive substrates. The machine provides a high degree of process flexibility, enabling the user to simultaneously process both positive and negative polarity devices as well as small and large substrates. The reactor also provides high-precision control of temperature and pressure, allowing for the precise deposition of multiple layers with a single operation. The tool is optimized for the production of advanced high power device production and the processing of wafer level packages. The asset is also suitable for general thermal evaporation and photo-resist coating processes. Centura MxP reactor equipped with an optimized chamber design has a high throughput rate, improved process control and homogeneity, and minimized thermal reactivity to improve device production yield. The integrated plasma source is designed to allow for the deposition of multiple layers on the same substrate. The model also features a large-area chamber, which provides a superior thermal homogeneity and uniformity for efficient processing. APPLIED MATERIALS Centura MxP reactor offers efficient and reliable process control with a set of advanced features such as multiple chamber control and monitoring techniques, including gas sensing and atmosphere control. The built-in Ethernet/IP protocol ensures capacity to transfer data as well as increase processing speed. The equipment also features advanced safety features to protect workers from hazardous processes. Overall, Centura MxP reactor is an advanced, high-performance system designed for efficient and cost-effective fabrication of mass-market products and wafer structures. The integrated technologies and advanced design ensure maximum efficiency and quality, making it the ideal choice for large-scale production of semiconductor devices.
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