Used APPLIED MATERIALS Endura 5500 #180431 for sale

Name: APPLIED MATERIALS Endura 5500
Brand: APPLIED MATERIALS
SKU: 180431
Availability: SoldOut

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Reactors

Manufacturer

APPLIED MATERIALS

Model

Endura 5500

ID: 180431

Wafer Size: 8"

Vintage: 1999

PVD system, 8" Specifications: Main frame: through the wall configuration Wafer handing: SNNF Front panel type: Painted Software version: 8.91 Single board computer in controller: Yes Ion gauges: 451 nude Robots: Buffer robot: HP+ Blade material: Original metal Load lock: No wide body Index handler type: Enhanced tilt out Loadlock vents: Variable soft vent + fast vent Transfer robot: VHP Blade material: CVD compatible Narrow body: Yes (Tilt-out) Chamber specifications: Chamber 2: Metal / Applic.: IMP Tin Body Style: Vectra Imp Source type: Vectra Imp Power Supply: 12kW Power Supply: 12kW Heater: B101 Basic chamber setup: A. Pass through B. Cool down C. PC 2 D. PC 2 E. Orientor with Std Degas F. Orientor with Std Degas Gasline fittings: AMAT specifications For preclean / CVD: Chamber C: Vacuum pump type: Ebara RF match: 180431 Cable length: 75" RF match type: 8" Power supply: RFPP 10A Chamber D: Vacuum pump type: Ebara RF match: 180431 Cable length: 75" RF match type: 8" Power supply: RFPP 10A MFC type: Process MCF-1: 2: AR (size 100) 3: Hecar; BTpur;EDpur ;Phat (size 500;2000;3000;1) 4: AR (size 100) C: AR (size 20) D: AR (size 20) Process MFC-2: 2: N2 (size 100) 3. 500;2000;3000;1 (size 1000;1000;1000) C. AR (size 300) D. AR (size 300) Paste chamber: Yes (chamber 5) System roughing pump type: Ebara Chamber cryo pump type: OB8F Umbilicals: - mainframe to controller: Yes - mainframe to generator racks: Yes - mainframe to cryo compressor: Yes - main AC to system controller/sys. AC: Yes - syst cont/sys AC to primary Gen rack: Yes - main AC to primary generator rack: Yes - main AC to pump frame: Yes - main AC to Neslab heat exchanger: Yes - monitor cable: Yes - monitor2 cable: Yes - monitor3 cable: Yes CE Mark: Yes EMO Option: Yes EMO button guard rings: Yes Water leak detector: Yes Buffer and transfer lid hoist: NO Support Equipment: Heat exchangers: Number: 1 Type: AMAT Cryo compressors: Yes Number: 2 Type: 9600 Cryo He lines Yes Neslab present: Yes Resistivity meter: NO Manuals not included Installed 1999 vintage.

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APPLIED MATERIALS Endura 5500 is a high-end, multi chamber reactor dedicated to improving the performance and reliability of silicon based devices. Endura 5500 is designed to provide high yields at the lowest possible cost while still maintaining the highest quality and precision. The advanced design of APPLIED MATERIALS Endura 5500 allows for various silicon-based processes to be carried out in a single tool, such as deposition, etch, anneal, deposition, etch and inspection. As a result, Endura 5500 is able to provide the highest throughput with the highest yields in the industry. APPLIED MATERIALS Endura 5500 uses an innovative dual pump equipment, which allows for flexibly and fast tuning of process parameters at all stages of production. The system uses highly efficient pump speeds in order to reduce contamination, while also providing the necessary power to complete many different processes. Additionally, the unit utilizes infrared heating on the wafers, giving the user complete control over the process temperatures. Endura 5500 is a reliable and robust reactor well suited for fabricating semiconductor wafers using the most advanced semiconductor processes. The machine is equipped with a high degree of automation, which allows for the realization of complex procedures without manual intervention. Furthermore, APPLIED MATERIALS Endura 5500 is designed to be compatible with modern control systems and allows for the integration of different software platforms into the tool. Endura 5500 is capable of carrying out a wide variety of processes, including Chemical Vapor Deposition (CVD), to deposit materials in a controlled environment, process temperatures up to 1100°C and a pressure range up to 10 Torr. This allows for single and double sided processes, such as metalization and photolithography, to be completed quickly and with a high degree of control. APPLIED MATERIALS Endura 5500 is equipped with a unique Crystal Grower Module (CGM) which is capable of crystal growth and doping services, both of which are necessary for the creation of certain types of semiconductor devices. The CGM provides exact control over the temperature and pressure, allowing for the controlled and precisely doped materials to be obtained. Endura 5500 reactor is designed to be an automated, cost effective and technologically advanced asset. It's comprehensive range of features makes it an ideal choice for the fabrication of semiconductor devices that require the highest levels of precision and quality. This reactor is a reliable and trustworthy tool, suitable for many different processes and will provide reliable performance for many years to come.