Used APPLIED MATERIALS P 5000 #129972 for sale

APPLIED MATERIALS P 5000 is a state-of-the-art plasma enhanced chemical vapor deposition (PECVD) reactor that offers enhanced throughput, improved device performance, and superior repeatability across production runs, ultimately leading to superior device quality. The equipment offers fast, repeatable, and precise product processing time, and can easily scale from small to large substrate sizes. APPLIED MATERIALS P5000 is designed to work in both R&D and production manufacturing environments. The main components of the system include the chamber, base frame, power supplies, and process controller. Inside the chamber, the source and vacuum pumps supply process gas and remove byproducts. The power supplies provide control over the various PECVD process parameters such as the process gases, RF power, and pressure. The process controller stores the process recipe and is responsible for the coordination of all the different parameters during a deposition process. The chamber of P-5000 is fitted with an RF electrode and chuck to hold the substrate during the deposition process. The RF power is controlled by the power supplies and the chuck temperature is maintained through a precise temperature control unit. Various process gases can be supplied individually or as mixtures, which is determined based on the semiconductor material being deposited. The pressure inside the chamber is controlled by a turbomolecular pump, which helps to ensure a precise concentration of the process gases. Once a deposition recipe is entered by the operator, the process controller is responsible for managing the different parameters to ensure repeatability in the deposition process. The pressure and flow of the process gas are continually monitored and adjusted to ensure the best layer of material is deposited. The RF power, chuck temperature, and pressure are also monitored and adjusted to ensure device uniformity. Using P5000, customers are able to deposit advanced materials such as silicon nitride, oxidized silicon, and silicon carbide with superior repeatability. This machine also offers an integrated etching solution that is capable of removing unwanted material or patterning the deposited material. APPLIED MATERIALS P-5000 is ideal for advanced semiconductor materials and can be used in the production of various electronic devices. With its advanced features, high throughput, and repeatable results, P 5000 is an invaluable tool for the industrial and research facilities looking for high-end performance.