Used APPLIED MATERIALS P 5000 #57339 for sale

APPLIED MATERIALS P 5000 is a high-powered ion implanter for semiconductor manufacturing. It is used to deposit dopants onto semiconductor wafers - a fundamental process in semiconductor fabrication. This tool is capable of implanting ions of varying energy into the semiconductor surface with high precision and accuracy. APPLIED MATERIALS P5000 has a wide range of adjustable parameters, such as dosimetry, beam shaping, and beam energy, which allow for precise implantation of dopant profiles. It also has an integrated beam monitoring system which ensures high product quality and process reliability. P-5000 utilizes an innovative microwave plasma ion source which allows it to operate at very high currents. This creates electrically charged atoms (ions) which are then accelerated and focused into a beam. The beam is used to implant the dopant ions at a precise angle and depth into the semiconductor surface. APPLIED MATERIALS P-5000 also utilizes a state-of-the-art robotics system to facilitate the precise positioning of wafers in the implanter. This helps to ensure uniform implantation over the entire wafer surface. P5000 includes a variety of safety features, such as interlocks and safety interlocks, to ensure operator safety. It also has an intuitive GUI, which makes it easy to configure, monitor, and adjust implant parameters. P 5000 is ideal for high-volume production of semiconductor devices, and its advanced features help to ensure high yield and excellent product quality. It is also robust enough to handle long-term use and its high accuracy contributes to a reduction in the cycle time of the implant process.