Used APPLIED MATERIALS P 5000 #9236198 for sale

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Manufacturer
APPLIED MATERIALS
Model
P 5000
ID: 9236198
CVD System TEOS Plasma enhanced Thermal chemical vapor deposition system.
APPLIED MATERIALS P 5000 is a high-performance reactor used for performing a variety of vapor deposition processes as well as other advanced thin film technologies. This revolutionary technological tool has been developed by APPLIED MATERIALS to meet the rigorous needs of today's production facilities. APPLIED MATERIALS P5000 enables a wide array of processes to be performed in a single chamber, including Ultra High Deposition Rate (UHDR) process for the deposition of thin films. The unit also incorporates both conventional vapor deposition and plasma-enhanced deposition technologies. This versatility allows users to perform an extensive range of process operations, such as those for the manufacture of semiconductor devices, device packaging, flat-panel displays, optical films, microelectronic components, and many more. P-5000 provides exceptional value through superior process capabilities, advanced temperature and pressure control, high deposition rate, and improved product quality. Its unique design solution offers the highest throughput and reliability with a wide range of process capabilities and throughput rates. The chamber of P5000 is constructed from a highly durable material designed to provide excellent corrosion and abrasion resistance. The chamber design incorporates many advanced features including laser welding, water cooling, air filtration and inert atmosphere protection. APPLIED MATERIALS P-5000 also incorporates a powerful digital programming equipment. This system allows users to program all of the chamber parameters and the process times in order to achieve the desired deposition rate. The programming unit also supports automatic start/stop control, allowing users to quickly switch between different processes without any delay. P 5000 offers outstanding user-friendliness, enabling users to quickly perform and monitor all the functions of the chamber from a single location. Its user-friendly design also offers a wide range of features and functions that enables users to optimize their processes, maximize productivity, and improve the output quality. Overall, APPLIED MATERIALS P 5000 is an advanced reactor offering a wide range of capabilities and features that make it the ideal tool for performing various vapor deposition and thin film processes. Its superior design, machine capabilities, advanced automation, and user-friendly interface make it one of the most reliable and efficient reactors on the market.
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