Used APPLIED MATERIALS Producer III #176119 for sale

APPLIED MATERIALS Producer III is a high-performance tool used in the fabrication of thin film materials. It is an advanced reactor equipment capable of controlling the deposition of thin films to high levels of quality and uniformity. Producer III is a multi-source, multi-target machine with a high level of accuracy and repeatability. The system uses a vacuum chamber capable of achieving base pressures of up to 10-9 torr. The chamber is equipped with an upper substrate positioner and an external loadlock. The integrated source substrates and targets are made of zirconia with ceramic insulators between each source material to achieve effective separation and to maintain uniformity. APPLIED MATERIALS Producer III utilizes a dual-beam electron beam. The electron beams are used to evaporate the source material onto the substrate in a tightly-controlled process that ensures the excellent uniformity and quality of the thin film. The combination of the dual-beam and the high-vacuum environment make the unit ideal for high-rate, high-precision deposition processes. The machine can also be used for reactive deposition, where the substrate is exposed to a reactive gas while being exposed to the electron beams. The combination of the electron beams and the reactive gas ensure accurate control of the composition of the thin film and enable the fabrication of complex thin film structures. Producer III tool is equipped with a number of process control and monitoring tools. These include a real-time process monitor, data logging of process conditions, and an integrated automatic substrate placement asset that improves the accuracy of the thin film deposition process. These tools enable the user to monitor and adjust the process with greater accuracy, enabling tighter uniformity and quality of the thin film structure. APPLIED MATERIALS Producer III is a highly versatile, high-performance tool for the fabrication of thin film materials. It is capable of delivering superior uniformity and quality of the thin film structures. Through the use of dual electron beams, the model enables highly-accurate control of the deposition process, enabling the fabrication of complex and high-precision thin film structures. The real-time process monitoring and data logging tools enable high levels of process control and ensure high levels of quality and uniformity.