Used ASM Epitaxy #166041 for sale

ASM Epitaxy reactors provide efficient, secure and precise epitaxial deposition of semiconductor materials. Epitaxial deposition is the process of depositing ultrathin layers of semiconductor material onto a substrate, in order to expand and enhance semiconductor device performance. Epitaxy reactor is an efficient reactor system that uses the physical vapor deposition technique, which passes a source material to the substrate for deposition through evaporation, sputtering, andor ion bombardment. The reactor consists of several components, including a source material chamber, a vacuum chamber, and a substrate stage. The source material chamber consists of a vacuum chamber where the source material is heated and evaporated. The substrate stage is typically cooled to promote uniform and rapid growth of the substrate. The surface of the substrate is then exposed to the vaporized source material, and the material coalesces on the surface of the substrate material to form the epitaxial layers. The reactor provides an efficient method for epitaxial deposition thanks to its uniformity in thickness, coverage and epitaxial layer quality. The layers obtained on the substrate usually have a uniform thickness, as well as a uniform coverage across the substrate. Additionally, due to the lower growth temperature, crystal perfection and/or structural perfection of the evaporated material is maintained. ASM Epitaxy also provides a uniformity in growth rate and deposition rate, which helps maintain the crystal perfection of the evaporated material, as well as the uniform coverage and thickness of the layers. The uniform coverage and layer thickness enable efficient yield rates, since there is less of a chance for defects. The reactor is highly efficient, due to its ease of use. The source material can be easily changed out, and the user can control the rate of deposition as needed. Additionally, the reactor features easy-to-understand user interfaces, which make it simple for new users to understand the operating parameters of the deposition process. In conclusion, Epitaxy offers a secure and precise method for epitaxial deposition. It simplifies the deposition process, while at the same time providing the user with uniform coverage, layer thickness, and crystal perfection of the evaporated material. As a result, the efficiency of the reactor is beneficial to semiconductor device designers and manufacturers, due to its reliable and consistent results.