Used AVIZA / OMEGA 201 #9396141 for sale

AVIZA / OMEGA 201
Manufacturer
AVIZA / OMEGA
Model
201
ID: 9396141
Deposition system.
AVIZA / OMEGA 201 is a reactor developed by Zircon Corporation as a tool for semiconductor fabrication and chemistry. This reactor uses up to three levels of plasma processes to achieve its desired results: low pressure chemical vapor deposition (LPCVD), chemical plasma etching (CPE), and chemical vapor deposition (CVD). The reactor is a cylindrical device that is approximately seven feet tall and two feet wide, and it is enclosed within a vacuum chamber made of stainless steel. AVIZA 201 operates as an atmospheric-pressure plasma chamber, specifically in the induction-coupled electron cycle. From the outside, this reactor has two distinct ports for internal processes: one for process gas inlet and one for a vacuum pump. The internals of the reactor consists of a power supply, a vacuum supply, chamber walls, and electrodes to facilitate the electron cycle. Each of these components works synergistically to create the desired outcome. The power supply used in OMEGA 201 is a mid-frequency, voltage-controlled generator capable of delivering up to 1000 watts of power. This power is used to create the plasma environment in the reactor chamber. The vacuum supply pumps down the chamber to a pressure of 20 mililibar or less, thus providing a stable atmospheric environment for the processes. The chamber walls and electrodes are made of metal and coated with material that resists heat and chemical degradation. The electrodes are used to create the electron cycle, whereby an electrical energy is transferred to the electrodes and creates a plasma by exciting the process gas to a high-energy state. This plasma is used to create the desired reaction within the reactor chamber, either by CVD, CPE, or LPCVD processes. 201 is designed to provide extemporaneous and accurate results for semiconductor fabrication and chemistry. The precise power supply and up to three-levels of plasma processing create an optimal environment for chemical reactions that have been optimized for maximum yield. This reactor has been successfully used to create semiconductors and high-tech products.
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