Used CAMBRIDGE NANOTECH Fiji F200 #293651884 for sale
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ID: 293651884
Vintage: 2010
Atomic Layer Deposition (ALD) system
Substrate, 8"
ADIXEN ATH-400M Pump
Aluminum oxide
Manual load lock
Chamber
(6) Heater precursor lines
Gases: N2, Ar, O2, H2, NH3
Plasma enhanced ALD
Thermal ALD with temperature: Up to 300°C
No heater jacket
No APC
Optimize:
ALD Reactor
Heater
Trap geometry
2010 vintage.
CAMBRIDGE NANOTECH Fiji F200 is a powerful, digital-enabled, industrial-grade atmospheric-pressure plasma reactor. It is ideal for precision thin film deposition, surface activation, surface treatment, and post-deposition treatment. Thanks to its capability to chemically modify the surface of any substrate - metals, semiconductors, nanoparticles and dielectrics - with a wide variety of surface chemistries and structures, it enables the production of functional (hybrid) structures and materials with properties tailored to specific applications. CAMBRIDGE NANOTECH FIJI F 200 is based on the principle of hot cathode, direct-resonant inductor plasma source and making use of dielectric barrier discharge. It consists of a multi-zone chamber with precisely engineered, temperature-controlled resistive heating elements to allow the controlled deposition of a variety of thin films on any type of substrates. The chamber is provided with an open port to accommodate the loading and unloading of the specimens. Fiji F200 comes with intuitive and user-friendly multi-mode control software which enables remote operation and parameter selection as well as the creation of custom control profiles for specific applications. It is compatible with a wide variety of process gases and can be operated with Argon, Nitrogen, Oxygen, Carbon Dioxide, Hydrogen, Neon or Ammonia. The source of plasma is highly stable and can be adjusted to complex combination of gas flow rates. FIJI F 200 is designed for high-production web-processing and a wide range of applications in the micro and nanofabrication industries. It has high throughput and features rapid process start/stop, enabling continuous production and effective cost control. It is highly efficient with low energy consumption, exceptional process repeatability and high-precision plasma control. In conclusion, CAMBRIDGE NANOTECH Fiji F200 is an innovative and powerful plasma reactor that combines state-of-the-art digital controls with precise plasma engineering, delivering an unmatched surface treatment solution. It is capable of accurately depositing thin films on any type of substrate and can be used in a variety of applications such as conducting thin films or dielectrics, surface activation treatments, and post-deposition treatments.
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