Used CAMBRIDGE NANOTECH Fiji F200 #9179531 for sale

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ID: 9179531
Vintage: 2010
Atomic layer deposition system Substrate, 8" Aluminum oxide Manual load lock Dual chamber (6) Heater precursor lines (5) Plasma gas lines Plasma enhanced ALD With (3) gases: O2, Ar, N2 Thermal ALD with temperature: Up to 300°C Turbo pump with APC Chemicals: TMA, Zr, Ti Optimize: ALD Reactor Heater Trap geometry 2010 vintage.
CAMBRIDGE NANOTECH Fiji F200 is a chemical vapor deposition (CVD) reactor used for both research and industrial-scale production of thin films. It is designed to be used in a variety of applications, including: solar cell production, optoelectronics, semiconductors, MEMS/NEMS, and displays. CAMBRIDGE NANOTECH FIJI F 200 is a next generation, high-precision CVD equipment that can deposit periodical thin films up to 0.5µm thick. It is designed for the experimental deposition of metals, semi-metals, and metal oxides. The system has two integrated process modules: deposition and mobility. Designed to be reliable and user-friendly, Fiji F200 has a low particle generation rate, low back pressure operation, low film stress, and uniform backside cooling for improved batch-mode uniformity. FIJI F 200 is a single-wafer reactor, and it is available in two model configurations: the CL-V and PD-V. Both models come with an intuitive, graphical user interface and an integrated video microscope. The CL-V configuration includes an integrated lifting arm that allows for easy loading and unloading of samples/substrates without contamination. The PD-V version has a built-in "self-stage" with an independent substrate holder that allows the unit to be opened for manual loading and unloading. CAMBRIDGE NANOTECH Fiji F200 comes with a variety of options, including automation, the OneView gas monitoring machine, a ring-shaped hotplate for greater uniformity control, and a backside cooling module. To meet the needs of a variety of processes, this reactor is equipped with a wide variety of process sources and carrier gases. For more precise deposition control, the tool includes a vibrant quartz selection chamber which helps to isolate the sample from the reactors exhaust, providing a clean, reaction-friendly environment. CAMBRIDGE NANOTECH FIJI F 200 is a reliable, user-friendly CVD reactor that can be used for a variety of thin film applications with precise deposition control. This reactor is a cost-effective solution for both research and industrial-scale production of thin film products.
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