Used CAMBRIDGE NANOTECH Fiji F200 #9179531 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9179531
Vintage: 2010
Atomic layer deposition system
Substrate, 8"
Aluminum oxide
Manual load lock
Dual chamber
(6) Heater precursor lines
(5) Plasma gas lines
Plasma enhanced ALD
With (3) gases: O2, Ar, N2
Thermal ALD with temperature: Up to 300°C
Turbo pump with APC
Chemicals: TMA, Zr, Ti
Optimize:
ALD Reactor
Heater
Trap geometry
2010 vintage.
CAMBRIDGE NANOTECH Fiji F200 is a chemical vapor deposition (CVD) reactor used for both research and industrial-scale production of thin films. It is designed to be used in a variety of applications, including: solar cell production, optoelectronics, semiconductors, MEMS/NEMS, and displays. CAMBRIDGE NANOTECH FIJI F 200 is a next generation, high-precision CVD equipment that can deposit periodical thin films up to 0.5µm thick. It is designed for the experimental deposition of metals, semi-metals, and metal oxides. The system has two integrated process modules: deposition and mobility. Designed to be reliable and user-friendly, Fiji F200 has a low particle generation rate, low back pressure operation, low film stress, and uniform backside cooling for improved batch-mode uniformity. FIJI F 200 is a single-wafer reactor, and it is available in two model configurations: the CL-V and PD-V. Both models come with an intuitive, graphical user interface and an integrated video microscope. The CL-V configuration includes an integrated lifting arm that allows for easy loading and unloading of samples/substrates without contamination. The PD-V version has a built-in "self-stage" with an independent substrate holder that allows the unit to be opened for manual loading and unloading. CAMBRIDGE NANOTECH Fiji F200 comes with a variety of options, including automation, the OneView gas monitoring machine, a ring-shaped hotplate for greater uniformity control, and a backside cooling module. To meet the needs of a variety of processes, this reactor is equipped with a wide variety of process sources and carrier gases. For more precise deposition control, the tool includes a vibrant quartz selection chamber which helps to isolate the sample from the reactors exhaust, providing a clean, reaction-friendly environment. CAMBRIDGE NANOTECH FIJI F 200 is a reliable, user-friendly CVD reactor that can be used for a variety of thin film applications with precise deposition control. This reactor is a cost-effective solution for both research and industrial-scale production of thin film products.
There are no reviews yet