Used CAMBRIDGE NANOTECH Savannah S-200 #293811829 for sale

CAMBRIDGE NANOTECH Savannah S-200 is a chemical vapor deposition (CVD) reactor designed for high-throughput processing and consistent nanoscale film deposition. The equipment utilizes a single quartz reactor chamber with a hermetically sealed door, which houses a high-precision wafer spinning process. The S-200 is capable of accurately controlling temperature, reactive gas flow, and pressure parameters to achieve consistent experimental repeatability. The S-200 utilizes a temperature range of 30-450°C, pressure range of 0-20 Torr, and selectable reaction gases capable of reactors from 150-750mm. The quartz reactor chamber houses the substrate wafer, the spin motor, and the linear/ms purge actuators. A dual crucible design in the reactor chamber allows for the use of two materials at once, and the precise control of the reactants. The spin motor delivers 8-20K rpm spin rate, allowing for fast deposition times and precise thickness control. Inside the reactor chamber are four gas inlet ports. The user can choose reaction gases from both inlet ports, allowing for dual experiments with different types of reactants. The high-precision wafer spinning process enables rapid, uniform deposition of materials without the need for spinning a substrate to speed up the process. After spinning, the S-200 exhausts the unreacted gas from the reactor chamber, reducing residual reactant reactivity and lowering film non-uniformity. The S-200 provides numerous utility features equally well-suited to both R&D and production environments. The system also includes a powerful graphical user interface (GUI) for configuring the reactor parameters, defining process zones, setting up batch runs, and monitoring deposition history. Integrated management and reporting tools let users monitor experimental output and unit performance, as well as document research runs. The user-friendly design of the machine makes it easy to access detailed process data, and CAMBRIDGE NANOTECH SAVANNAH S200 allows for quick data analysis and manipulation. Savannah S-200 is a reliable and precise CVD reactor well-suited for nanoscale film deposition. The reactor offers fast processing times, selectable reaction gases, and a wide temperature range, making it ideal for high-throughput research and production applications.