Used CAMBRIDGE NANOTECH Savannah S-200 #9365906 for sale

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ID: 9365906
Atomic Layer Deposition (ALD) System Pneumatic pulse valves Ozone generator Vacuum pump Aspect ratio: > 2000 Substrates size: Up to 8" (6) Precursor lines Gases: Ozone, Trimethylaluminum, Diethylzinc, Ammonia and Anhydrous Power supply: 115 V, 50/60 Hz, 20 A CE Marked.
CAMBRIDGE NANOTECH Savannah S-200 Reactor is a plasma-enhanced chemical vapor deposition (PECVD) equipment designed for advanced micro device fabrication. This tool enables deposition of film growth technology with an incredibly low footprint. The S-200 is suitable for a wide range of advanced dielectric and metal films as well as innovative materials research applications. The power source of S-200 is a RF generator whose frequency ranges from 13.56 MHz to 40 MHz. The adjustable power range from 200 W to 3,000 W and the precision level of + 0.01 ms. The substrate sizes of the S-200 are limited to 4 inch (10 cm) wafers with a maximum temperature range of 450°C. The adjustable pressure range from 0.6 Torr to 10 Torr. In order to meet high-quality chemical vapor deposition results, the S-200 requires only 5000 sccm of flow. The S-200's deposition vacuum chamber has gas inlet tubes to create uniform flow of gases for deposition. Electrodes are used in order to generate plasma. A non-evaporable getter (NEG) pump traps the impurities with the help of an array of titanium-based getter materials. The turbo molecular pumping group is used to maintain the chamber pressure. The S-200 has advanced safety features. An over-temperature limit control circuit prevents any abnormal gas flow or other malfunctions of the chamber. An isolated, high voltage cable isolates the high power sources of the system. The inlet manifold of the S-200 restricts the flow of the gases to ensure higher purity in the chamber. The S-200 also features a recipe storage unit, to store up to five recipes. An array of motors is included such that the different motion stages are controlled by separate joysticks as per user preference. A color LCD touch screen with a user-friendly, intuitive design allows the user to program the machine accurately. CAMBRIDGE NANOTECH SAVANNAH S200 Reactor is a high-tech deposition tool that offers safe and reliable PECVD solutions for advanced dielectric and metal film applications. The efficient mixture of gases, the vacuum control and the precise motor control make this reactor an ideal choice for research laboratories and production environment alike.
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