Used CANON / ANELVA COSMOS I-1201 #293597728 for sale
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ID: 293597728
Wafer Size: 12"
Vintage: 2002
PVD System, 12"
For solder bump
CANON ANELVA Cosmos 300 PVD System
(2) CANON ANELVA Unit-875CA Cryopump compressors
System rack
LCD Monitor rack
Controller rack
AC Power rack
Chiller
DC Rack
RF Rack
Cryo He hose
Process chambers:
Chamber-A (SLA-ICP)
Chamber-B, (3) Cooling and gate bulbs
Chamber-C
Chamber-D (Process: Cu)
Chamber-E (Process: Ti)
Chamber-F (Heat)
Dry pump racks:
EBARA AA10N Dry pump (upper stage)
EBARA AA10N Dry pump (lower stage)
Chambers:
Degas
SLA-ICP
Collimated CO
(2) STD-PVD
1022-41205C Channel relay box
1022-33862C Channel relay box
1022-39070C Channel relay box
(19) OMRON EE-SPX613 Liquid level sensors
ULVAC Qulee CGM-052 Gas analyzer
DENKI KOGYO STC-1S Matching control unit
DENKI KOGYO ST-1S Matching network
SMT1000J APC Smart-UPS 1000 LCD, 100 V
SUA1000J APC Smart-UPS 1000 VA USB, 100 V
ULVAC WPB-10-034 Pirani vacuum gauge
OMRON EE-SX674 Photo micro sensor
COPAL ELECTRONICS PG-35-102R-NVC Pressure gauge
Main breaker: 175/225 A
Interrupt current:10 A
Main UPS power supply
Power supply: 200 VAC, 50/60 Hz, 3-Phase, 3-wire (Ground)
2002 vintage.
CANON / ANELVA COSMOS I-1201 is a compact and high-performance sputtering reactor that is used for the deposition of thin films. It is a DC magnetron-type reactor that is capable of producing thin films at deposition rates up to 0.2 nm/s and has the ability to sputter virtually any material. The reactor is equipped with a mounting structure for holding substrates, an exhaust system for evacuating the chamber, an RF generator for controlling the process, and an ion source for manipulating the charges of ions. The reactor also features a magnetron-type heated filament for ion sources, an ion beam acceleration tube, an electron gun, and a multi-stage electron cylinder magnet. CANON COSMOS I-1201 is capable of producing high-quality, uniform thin films and can sputter virtually any material. It utilizes a high-frequency AC power supply to create a low-pressure environment in the chamber, which enables the sputtering of metal and metal oxide films. It is suitable for the production of copper, aluminum, titanium, zinc, and other metals as well as wide variety of metal oxide films. The reactor has an adjustable power level up to 1000 W and has the capability to adjust the deposition rate based on the thickness of the target material. The overall structure of ANELVA COSMOS I-1201 is designed for minimal maintenance and low running costs. Its modular design allows for easy disassembly and reassembly for maintenance purposes. The chamber features a sealedtop lid for easy cleaning and the substrate can be rotated and adjusted to obtain the desired angle and area of deposition. The machine is also equipped with gas and electric safety shut-off switches and a variety of process monitoring sensors that can be used to maintain optimal performance. COSMOS I-1201 is a powerful sputtering reactor that can be used to deposit thin films with superior quality at a reasonable cost. It offers high-precision control over the process and is capable of producing ultra-thin films with uniform thickness and excellent reproducibility. With its convenient maintenance structure, adjustable power levels and proven durability, CANON / ANELVA COSMOS I-1201 is the perfect choice for applications in the production of thin film components.
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