Used CANON / ANELVA COSMOS I-1201 #9397057 for sale

CANON / ANELVA COSMOS I-1201 is a type of reactor designed for applications such as etching and deposition in the semiconductor industry. It is a type of ion etch equipment, consisting of a cylindrical chamber with the sources and substrate placed within it, and the gas flow and other auxiliary systems around it. The chamber is divided into a main reaction chamber that has the sources, as well as several secondary chambers that are used for gas flow control and auxiliary functions. The main reaction chamber is cylindrical in shape and made of stainless steel. It has a diameter of 12 inches and a length of 16 inches, with an active height of 12 inches. It is capable of operation at pressures between 1.3×10-4 Pa and 0.6 Pa. It can be heated from room temperature up to 1000 degrees Celsius with an accelerating voltage of up to 20 kV. The main components of the chamber include a pair of electrostatic ion poles and an ion filter. The poles create a strong electric field that allows ions to be ionized and accelerated towards the substrate, which is held in place by a magnetically levitated sample holder. The ion filter allows only charged particles to pass through it, and thus controlling the type of material that is being deposited or etched. CANON COSMOS I-1201 comes with a set of gases, such as argon, boron trichloride, sulfur hexafluoride, and hydrogen sulfide, as well as an electrical power supply and various other accessories. The system also has an adjustable gas flow rate, which can be set from 0.1 to 100 cubic centimeters per minute, as well as an adjustable gas flow pattern, which allows for the control of the angle of deposition or etching. The unit comes with software that allows for the customization of etching and deposition parameters, as well as controlling the machine and monitoring its performance. The software also has a graphical user interface that allows for easy operation of ANELVA COSMOS I-1201. Overall, COSMOS I-1201 is a precise and versatile reactor that is suitable for a wide variety of processes in the semiconductor industry such as etching and deposition. Its design is well-suited for high quality, low volume work. It is also relatively simple and easy to operate, making it a useful tool for those who need to quickly and efficiently carry out their processes.